In situ surface cleaning of pure and implanted tungsten photocathodes by pulsed laser irradiation

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 469-473

  Afif, M ^a   Girardeau Montaut, J P ^a   Tomas, C ^a   Romand, M ^a   Charbonnier, M ^a   Prakash, N S ^a   Perez, A ^a   Marest, G ^a   Frigerio, J M ^b  

^a UNIVERSITÉ LYON 1   (France)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; ELECTRON EMISSION; ELECTRONS; EXCIMER LASERS; IN SITU PROCESSING; LASER PULSES; NEODYMIUM LASERS; PHOTOCATHODES; PHOTOEMISSION; PULSED LASER APPLICATIONS; TUNGSTEN; ULTRAVIOLET RADIATION;

HIGH DENSITY ULTRASHORT ELECTRON PULSES; IMPLANTED TUNGSTEN PHOTOCATHODES; IN SITU SURFACE CLEANING; KRYPTON FLUORIDE EXCIMER LASER; NEODYMIUM YTTRIUM ALUMINUM GARNET LASER; PHOTOCURRENT MEASUREMENT; PULSED LASER IRRADIATION; SURFACE CLEANING EFFECTS;

SURFACE CLEANING;

EID: 0030563065     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00460-2     Document Type: Article

References (9)

1. R.L. Sheffield, Report No. LA-UR-87-3036 and FEL Conf. (Los Alamos National Lab., Williamsburg, VA, 1987).
2. J.P. Girardeau-Montaut, C. Girardeau-Montaut, M. Afif, G. Haouat, C. Couillard, F. Sabary and S. Joly, Euroconf. on Generation and Application of Ultrashort X-Ray Pulses, Salamanca, Spain, 10-13 March 1994.
3. J.P. Girardeau-Montaut, C. Girardeau-Montaut, M. Afif, A. Perez and S.D. Moustaïzis, Appl. Phys. Lett. 66(15) (1995) 1886.
4. J.P. Girardeau-Montaut, C. Girardeau-Montaut and S.D. Moustaizis, J. Phys. D: Appl. Phys. 27 (1994) 848.
5. S. Szatmari and F.P. Schäfer, Appl. Phys. B46 (1988) 305.
6. A.H. Sommer, Photoemissive Materials (Robert Krieger Publishing Company, Huntington, NY, 1980).
7. B.J. Waclawski and E.W. Plummer, Phys. Rev. Lett. 2 (1972) 783.
8. E. Shubert and H.W. Bergmann, Laser Eng. 2 (1993) 111.
9. Y.F Lu, M. Takai, S. Komuro, T. Shiokawa and Y. Aoyagi, Appl. Phys. A 59 (1994) 281.