Wavelength sensitivity of photo-oxidation of polyethylene

Polymer Degradation and Stability

Volumn 55, Issue 2, 1997, Pages 131-134

  Hu, Xingzhou ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

IRRADIATION; LIGHT ABSORPTION; OXIDATION; PHOTOCHEMICAL REACTIONS; SENSITIVITY ANALYSIS; SPECTRUM ANALYSIS; TENSILE PROPERTIES; XENON;

ACTIVATION SPECTRA; INFRARED ABSORPTION; PHOTOOXIDATION; SPECTRAL SENSITIVITY CURVES; WAVELENGTH SENSITIVITY; XENON ARC RADIATION;

LOW DENSITY POLYETHYLENES;

EID: 0031075646     PISSN: 01413910     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0141-3910(96)00120-6     Document Type: Article

References (5)

1. Torikai, A., Chigata, K., Okisaki, F. & Nagata, M., Polym. Preprints Japan, 42 (1993) 2045.
2. Andrady, A. L., Pegram, J. E. & Searle, N. D., Unpublished data.
3. Trubiroha, P., In Int. Conf. Advances in Stabilization and Controlled Degradation of Polymers, ed. A. V. Patsis, Vol. 1. Technomic Publishing, Lancaster, PA, 1989, p. 236.
4. Zhang, Z., Hu, X. & Luo, Z., Polym. Degrad. Stab., 51 (1996) 93.
5. Carlsson, D.J., Garton, A. & Wiles, D.M., Macromolecules, 9 (1976) 695.