Wavelength sensitivity of photooxidation of polypropylene

Polymer Degradation and Stability

Volumn 51, Issue 1, 1996, Pages 93-97

  Zhang, Zhenfeng ^a   Hu, Xingzhou ^a   Luo, Zubo ^b  

^a INSTITUTE OF CHEMISTRY   (China)

^b Research Institute of Synthetic Mat   (China)

Author keywords

[No Author keywords available]

Indexed keywords

OXIDATION; PHOTOCHEMICAL REACTIONS; RADIATION EFFECTS; TENSILE STRENGTH;

CUT OFF FILTER TECHNIQUE; PHOTOOXIDATION;

POLYPROPYLENES;

EID: 0029771256     PISSN: 01413910     EISSN: None     Source Type: Journal    
DOI: 10.1016/0141-3910(95)00210-3     Document Type: Article

References (5)

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2. Andrady, A. L., Ami, M. B., Harmid, S. H., Hu, X. & Torikai, A., Ambio, 24(3) (May 1995) 191-96.
3. Torikai, A., Kato, H., Feuki, K., Susuki, Y., Okisaki, F. & Nagata, M., J. Appl. Polym. Sci., 50 (1993) 2185-90.
4. Hu. X. & Luo, Z., Polym. Degrad. Stab., 48 (1995) 99.
5. Hirt, R. C. & Searle, N. Z., Appl. Polvm. Symp., 4 (1967) 61-83.