Dry etch damage in III-V semiconductors

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 23-28

  Hu, Evelyn L ^a   Chen, Ching Hui ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; DRY ETCHING; ELECTRIC RESISTANCE MEASUREMENT; ELECTRONS; ENERGY GAP; ION BOMBARDMENT; IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR QUANTUM WELLS; SIMULATION; TRANSMISSION ELECTRON MICROSCOPY;

DEEP DAMAGE; DRY ETCH DAMAGE; PATTERN TRANSFER;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0031072584     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00123-2     Document Type: Article

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