Optimized process for electron beam nanolithography using AZPN114 chemically amplified resist

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 145-148

  Cui, Z ^a   Moody, R A ^a   Loader, I M ^a   Watson, J G ^a   Prewett, P D ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; NANOTECHNOLOGY; PHOTORESISTS; TEMPERATURE;

CHEMICALLY AMPLIFIED RESIST; POST APPLIED BAKE; POST EXPOSURE BAKE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031072176     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00175-X     Document Type: Article

References (3)

1. D. Macintyre and S. Thoms, Microelectronic Engineering, 30, 327 (1996)
2. C. Eckes, et al. Advances in Resist Technology and processing, SPIE 1466, 394 (1991)
3. BBN Software Products, A Division of Bolt Beranek and Newman Inc., 1992