Amine-Stabilized Cyclopentadienyl Diisobutyl Aluminum Complexes as New Kinds of Precursors for the Deposition of Thin Aluminum Films by CVD

Chemical Vapor Deposition

Volumn 3, Issue 1, 1997, Pages 33-35

  Scherer, Markus ^a   Kruck, Thomas ^a  

^a UNIVERSITY OF COLOGNE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; AMINES; CHEMICAL VAPOR DEPOSITION; METALLIZING; ORGANOMETALLICS; SILICON; STABILIZERS (AGENTS); THIN FILMS;

CYCLOPENTADIENYL DIISOBUTYL ALUMINUM COMPLEXES;

METALLIC FILMS;

EID: 0031071635     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.19970030105     Document Type: Article

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