Focused ion beam processing for microscale fabrication

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 517-522

  Walker, J F ^a   Moore, D F ^b   Whitney, J T ^a  

^a FEI Europe Ltd   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; IMAGING TECHNIQUES; ION BEAMS; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; MICROMACHINING; MILLING (MACHINING); PHOTOLITHOGRAPHY; SENSORS; SUPERCONDUCTING DEVICES; TRANSMISSION ELECTRON MICROSCOPY; YTTRIUM COMPOUNDS;

CANTILEVER BEAMS; FOCUSED ION BEAM; HIGH RESOLUTION IMAGING; MICROELECTROMECHANICAL SYSTEMS; PRECISION MILLING;

MICROELECTRONIC PROCESSING;

EID: 0029775433     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00299-5     Document Type: Article

References (24)

1. R.J. Young, Vacuum 44, 353 (1993).
2. K.E. Petersen, Proc. IEEE 70 420 (1982).
3. S.J. Sherman, W.K. Tsang, T.A. Core, R.S. Payne, D.E. Quinn, K.H.-L. Chau, J.A. Farash and S.K. Baum, IEDM 92 501, (1992).
4. L. Chau, S.R. Lewis, Y. Zhao, R.T. Howe, S.F. Bart and R.G. Marcheselli, 8th Int. Conf. Solid State Sensors Act., Eurosensors IX, Stockholm, Sweden, June 1995, p.593.
5. M.C.L. Ward, D.O. King and A.M. Hodge, Sensors and Actuators A46 205 (1995).
6. J.C. Jiang, V. Faynberg, R.C. White and P.K. Allen, J. Vac. Sci. Tech. B 11 1962 (1993).
7. th Int. Conf. Solid State Sensors Act., Yokohama, June 1993, p.822.
8. J. Fricke and E. Obermeier, J. Micromech. Microeng. 3 190 (1993).
9. J. Noetzel, T. Tonnesen, W. Benecke, J. Binder and G. Mader, 8th Int. Conf. Solid State Sensors Act. Eurosensors IX, Stockholm, Sweden, June 1995, p.671.
10. J.B. Sampsell, J. Vac. Sci. Tech. B 12 3242 (1994)
11. S.B. Waltman and W.J. Kaiser, Sensors and Actuators 19 201 (1989).
12. H.K. Rockstad, J.K. Reynolds, T.K. Yang, T.W. Kenny, W.J. Kaiser and T.B. Gabrielson, 8th Int. Conf. Solid State Sensors Act., Eurosensors IX, Stockholm, Sweden, June 1995, p.675.
13. D.F. Moore, M.I. Lutwyche and A.C.F. Hoole, J. Vac. Sci. Tech. B 11 2548 (1993).
14. T. Hirano, D. Kobayashi, T. Furuhata and H. Fujita, Japanese J. Appl. Phys. 33 1202 (1994).
15. M.I. Lutwyche and Y. Wada, Appl. Phys. Lett. 66 2807 (1995).
16. D.F. Moore, S.C. Burgess, H-S. Chiang, H. Klaubert, N. Shibaike and T. Kiriyama MM95 Conference, Texas, U.S.A., October 1995
17. B. Diem, P. Rey, S. Renard, S. Viollet-Bosson, H. Bono, F. Michel, M.T. Delaye and G. Delapierre, Sensors and Actuators A46 8 (1995).
18. In collaboration with STS, Abercarn, Wales.
19. J. Clarke, Proceedings IEEE 77 1208 (1989).
20. A.J. Pauza, D.F. Moore, A.M. Campbell, A.N. Broers and K. Char, IEEE Trans. Appl. Super-conductivity 5 3410 (1995).
21. D.F. Moore and A.J. Pauza R & D Association for Future Electron Devices FED-137, 47 (1994).
22. A. Legris, F. Rullier-Albenque, E. Radeva and P. Lejay, J. Phys. I France 3 1605 (1993).
23. M.H.F. Overwijk, F.C. van der Heuvel, C.W.T. Bulle-Lieuwma, J. Vac. Sci. Tech. B 11 2021 (1993).
24. R. Hull, M. Moore, D. Bahnck, M. Geva, R.F. Karlicek Jr., F.A. Stevie, J.F. Walker, ECS, Reno, USA, May 1995.