The formation of acid diffusion wells in acid catalyzed photoresists

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 169-174

  Petersen, John S ^a   Byers, Jeffrey D ^a   Carpio, Ronald A ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; CHEMICAL REACTIONS; DIFFUSION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOLITHOGRAPHY;

ACID DIFFUSION; CHEMICALLY AMPLIFIED RESIST; PHOTOGENERATED ACID; POST EXPOSURE BAKE;

PHOTORESISTS;

EID: 0031069262     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00086-X     Document Type: Article

References (9)

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