Emission channeling studies of Li in semiconductors

Physics Report

Volumn 280, Issue 3-4, 1997, Pages 145-285

  Wahl, Ulrich ^a,b  

^a UNIVERSITY OF KONSTANZ   (Germany)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

III V semiconductors; Ion implantation; Lattice location of Li; Silicon

Indexed keywords

EID: 0031065904     PISSN: 03701573     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0370-1573(96)00021-X     Document Type: Review

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