Novel infrared detector

Infrared Physics and Technology

Volumn 38, Issue 1, 1997, Pages 9-12

  Yang, Yukun ^a   Li, Wenming ^a   Yu, Lei ^a   Sun, Xin ^a   Xu, Lixing ^a   Hou, Lantain ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; HETEROJUNCTIONS; SEMICONDUCTING LEAD COMPOUNDS; SEMICONDUCTOR GROWTH; SILICON WAFERS; SUBSTRATES;

HOT WALL EPITAXY;

INFRARED DETECTORS;

EID: 0031062029     PISSN: 13504495     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1350-4495(96)00027-8     Document Type: Article

References (9)

1. G. Scott, D.E. Mercer and C.R. Helms, J. Vac. Sci. Technol. B 9(3) (1991) 1781.
2. H. Sigmund and K. Berchtold, Phys. Status Solidi 20 (1967) 255.
3. Andrew J. Steckl, Hamman Elabd, Ka-Yee Tam, Shey-Ping Sheu and M.E. Motamedi, IEEE Trans. Electron Devices ED-27(1) (1980) 126.
4. G. Scott and C.R. Helms, J. Vac. Sci. Technol. B 9(3) (1991) 1785.
5. H. Zogg and M. Hüppi, Appl. Phys. Lett. 47 (1985) 133.
6. H. Zogg, S. Blunier, A. Fach, C. Maissen and J. Masek, Opt. Eng. 33 (1994) 1440.
7. P.R. Vaya, J. Majhi, B.S.V. Gopalam and C. Dattatreyan, Phys. Status. Solidi A 93 (1986) 353.
8. Yang Yukun, Li Wenming, Yu Lei, Yang Yi, Xu Lixing, Xiong Xin, Wang Shanli and Huang Helan, Chin. J. Semicond. 16(8) (1995) 594.
9. Yukun Yang, Wenming Li, Lei Lu, Yi Yang, Lixing Xu, Xin Xiong, Shanli Wang and Helan Huang, J. Cryst. Growth 165 (1996) 70.