Magnetically enhanced inductively coupled plasma CVD for a-Si:H fabrication

Vacuum

Volumn 48, Issue 1, 1997, Pages 1-6

  Murata, M ^a   Takeuchi, Y ^a   Nishida, S ^a  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANTENNAS; ELECTRODES; GLASS; HYDROGENATION; MAGNETIC FIELDS; PLASMA APPLICATIONS; SOLAR CELLS; SUBSTRATES; THIN FILM TRANSISTORS;

DEPOSITION RATE; DRIFT MOTION; NEGATIVE SELF BIAS POTENTIAL;

CHEMICAL VAPOR DEPOSITION;

EID: 0030835114     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(96)00241-2     Document Type: Article

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