X-ray intensity decrease from absorption effects in mechanically milled systems

Scripta Materialia

Volumn 36, Issue 1, 1997, Pages 41-46

  Leonard, R T ^a   Koch, C C ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; CAMERAS; DIFFRACTOMETERS; ENERGY ABSORPTION; GERMANIUM; LEAD; MATHEMATICAL MODELS; MECHANICAL ALLOYING; MIXTURES; POWDER METALS; SILICON; TIN;

KLUG-ALEXANDER MODEL; MECHANICALLY MILLED SYSTEMS; MIXTURES RULE; X RAY ABSORBERS; X RAY ABSORPTION EFFECTS; X RAY INTENSITY DECREASE; X RAY LINEAR ABSORPTION COEFFICIENT;

X RAY DIFFRACTION;

EID: 0030736983     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(96)00333-8     Document Type: Article

References (11)

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7. M. Atzmon, private communication.
8. R. T. Leonard, X-ray Absorption Effects in the Mechanically Milled Silicon-Tin System, North Carolina State University Master's Thesis, 1994.
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10. H. P. Klug and L. E. Alexander, X-ray Diffraction Procedures, John Wiley and Sons, Inc., (1974).
11. E. Ivanov, J. Materials Synthesis and Processing, 1, 405 (1993).