Step ordering during OMCVD growth on non-planar substrates

Journal of Crystal Growth

Volumn 170, Issue 1-4, 1997, Pages 689-694

  Reinhardt, F ^a   Dwir, B ^a   Biasiol, G ^a   Kapon, E ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; SEMICONDUCTOR GROWTH; SEMICONDUCTOR QUANTUM WELLS; SEMICONDUCTOR QUANTUM WIRES; SUPERLATTICES; SURFACE STRUCTURE;

SURFACE STEP ORDERING;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0030687217     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00571-4     Document Type: Article

References (8)

1. M. Shinohara, H. Yokoyama and N. Inoue, J. Vac. Sci. Technol. B 13 (1995) 1773.
2. C.C. Hsu, J.B. Xu and I.H. Wilson, Appl. Phys. Lett. 65 (1994) 1394.
3. C.C. Hsu, J.B. Xu, I.H. Wilson, T.G. Andersson and J.V. Thordson, Appl. Phys. Lett. 65 (1994) 1552.
4. B. Dwir, F. Reinhardt and E. Kapon, G-II.4, Proc. of E-MRS '95, Strasbourg, France; Mater. Sci. Technol. B (1996), in press.
5. F. Reinhardt, B. Dwir, G. Biasiol and E. Kapon, Paper 134 ICSFI-5 95 (Princeton, New Jersey, USA); Appl. Surf. Sci. 104/105 (1996) 529.
6. A. Gustafsson, F. Reinhardt, G. Biasiol and E. Kapon, Appl. Phys. Lett. 67 (1995) 3673.
7. G. Biasiol, E. Martinet, A. Gustaffson, F. Reinhardt and E. Kapon, Appl. Phys. Lett. (1996), to be published.
8. R. Nötzel, T. Fukui, H. Hasegawa, J. Temmyo, A. Kozen and T. Tamamura, Chem. Vapor Deposition 1 (1995) 81.