Large scale manufacturing of compound semiconductors by MOVPE

Journal of Crystal Growth

Volumn 170, Issue 1-4, 1997, Pages 92-96

  Thompson, A G ^a   Stall, R A ^a   Kroll, W ^a   Armour, E ^a   Beckham, C ^a   Zawadzki, P ^a   Aina, L ^b   Siepel, K ^b  

^a EMCORE CORPORATION   (United States)

^b M/A COM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; EPITAXIAL GROWTH; LARGE SCALE SYSTEMS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR GROWTH; VAPOR PHASE EPITAXY;

LARGE SCALE MANUFACTURING;

METALLORGANIC VAPOR PHASE EPITAXY;

EID: 0030674787     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00552-0     Document Type: Article

References (6)

1. C. Beckham, R.A. Stall, A.G. Thompson, L, Aina and K. Seipel, in: GaAs MANTECH Conf., San Diego, CA, 1996, pp. 174-176.
2. W.G. Breiland and K.P. Killeen, J. Appl. Phys. 78 (1995) 6726.
3. H. Hou, H. Chui, B. Hammons, W. Breiland and K. Choquette, Eighth Int. Conf. Metalorganic Vapour Phase Epitaxy, Cardiff, Wales, June 9-13, 1996, paper OL.2.
4. A.G. Thompson, W. Kroll, M.A. McKee, R.A. Stall and P. Zawadzki, III-V Review 8 (1995) 14.
5. A. G. Thompson, R.A. Stall, P. Zawadzki and G.H. Evans, J. Electron. Mater. 25 (1996) 1487.
6. W.G. Breiland and G.H. Evans, J. Electrochem. Soc. 138 (1991) 1806.