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Volumn 159, Issue 1, 1997, Pages 39-51
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The influence of hydrogen on CVD-growth on Si(111) surfaces
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Author keywords
[No Author keywords available]
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Indexed keywords
ADSORPTION;
CHEMICAL VAPOR DEPOSITION;
DESORPTION;
HYDROGEN;
MOLECULAR BEAM EPITAXY;
NUCLEATION;
SCANNING TUNNELING MICROSCOPY;
SEMICONDUCTING SILICON;
SILANES;
GAS PHASE PRECURSOR;
SILICON HOMOEPITAXY;
SEMICONDUCTOR GROWTH;
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EID: 0030671927
PISSN: 00318965
EISSN: None
Source Type: Journal
DOI: 10.1002/1521-396X(199701)159:1<39::AID-PSSA39>3.0.CO;2-N Document Type: Article |
Times cited : (11)
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References (15)
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