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Applied Physics Letters

Volumn 68, Issue 2, 1996, Pages 197-199

Surface adhesion reduction in silicon microstructures using femtosecond laser pulses

(5) Tien, N C a Jeong, S b Phinney, L M c Fushinobu, K c Bokor, J a

a UNIVERSITY OF CALIFORNIA (United States)

b UNIVERSITY OF CALIFORNIA (United States)

c UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHARGE CARRIERS; CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; IRRADIATION; LASER PULSES; MICROMACHINING; PULSED LASER APPLICATIONS; SUBSTRATES; SURFACE PHENOMENA;

FEMTOSECOND LASER PULSES; HIGH TEMPERATURE CARRIERS; POLYSILICON CANTILEVERS; PULSE DURATION; PULSE WIDTH; SILICON MICROSTRUCTURES; SURFACE ADHESION REDUCTION;

SEMICONDUCTING SILICON;

EID: 0030574515 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.116458 Document Type: Article

Times cited : (32)

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