Raman spectroscopy of laser ablated BaTiO3/YBa2Cu3O7-x thin film bilayer structure

Applied Physics Letters

Volumn 68, Issue 6, 1996, Pages 750-752

  Cui, Dafu ^a   Li, Chunling ^a   Ma, Kun ^a   Zhou, Yueliang ^a   Liu, Yanwei ^a   Chen, Zhenghao ^a   Ma, Jianwei ^a   Li, Lin ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM TITANATE; CRYSTAL ORIENTATION; LASER ABLATION; LATTICE CONSTANTS; PHONONS; RAMAN SPECTROSCOPY; SINGLE CRYSTALS; X RAY CRYSTALLOGRAPHY; YTTRIUM COMPOUNDS;

BILAYERS; FULL WIDTH AT HALF MAXIMUM; PULSED LASER ABLATION; STRONTIUM TITANATE; TETRAGONAL PHASE; YTTRIUM BARIUM COPPER OXIDE;

THIN FILMS;

EID: 0030569883     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116730     Document Type: Article

References (16)

1. D. Roy and S. B. Krupanidhi, Appl. Phys. Lett. 61, 2057 (1992).
2. K. Nashimoto, D. K. Fork, F. A. Ponce, and J. C. Tramontana, Jpn. J. Appl. Phys. 32, 4099 (1993).
3. M-B. Lee, M. Kawasaki, M. Yoshimoto, and H. Koninuma, Appl. Phys. Lett. 66, 1331 (1995).
4. L. H. Robins, D. L. Kaiser, L. D. Rotter, and P. K. Schence, J. Appl. Phys. 76, 7487 (1994).
5. J. Zhang, Z. H. Chen, D. F. Cui, H. B. Lu, Y. L. Zhou, L. Li, G. Z. Yang, N. Jiang, and J. M. Hao, Appl. Phys. Lett. 66, 2069 (1995).
6. I. Taguchi, A. Pignolet, L. Wang, M. Proctor, F. Levy, and P. E. Schmid, Appl. Phys. Lett. 74, 6625 (1993).
7. J. L. Parsons and L. Rimai, Solid State Commun. 5, 423 (1967).
8. A. Scalabrin, A. S. Chaves, D. S. Shim, and S. P. S. Porto, Phys. Status Solidi B 79, 73 (1977).
9. B. Jannot, L. Gnininvi, and G. Godefroy, Ferroelectrics 37, 669 (1981).
10. T. W. Kim, M. Jung, H. J. Kim, Y. S. Yoon, W. N. Kang, and S. S. Yorn, Appl. Phys. Lett. 62, 1788 (1993).
11. D. L. Kaiser, M. D. Vaudin, G. Gillen, C-S. Hwang, L. H. Robins, and L. D. Rotter, J. Cryst. Growth 137, 136 (1994).
12. A. Pinczuk, W. Taylor, E. Burstein, and I. Lefkowitz, Solid State Commun. 5, 429 (1967).
13. G. Burns and F. H. Dacol, Phys. Rev. B 18, 5750 (1978).
14. D. H. Ha, I. K. Jeong, E. J. Shin, D. Kim, and Y. K. Park, Jpn. J. Appl. Phys. 33, L510 AIP
15. D. F. Cui, J. Zhang, Z. H. Chen, M. He, Y. L. Zhou, H. B. Lu, L. Li, and G. Z. Yang, Chin. Sci. Bull. (in press).
16. P. K. Schenck, M. D. Vaudin, B. W. Lee, D. W. Bonnell, J. W. Hastin, and A. J. Paul, in Ferroelectric Thin Film IV, Mater. Res. Soc. Proc. 361, edited by S. B. Desu, B. A. Tuttle, R. Ramesh, and T. Shiosaki (Materials Research Society, Pittsburgh, PA, 1995), p. 527