In situ monitoring in the pulsed laser deposition of ferroelectric thin films

Materials Research Society Symposium - Proceedings

Volumn 361, Issue , 1995, Pages 527-532

  Schenck, Peter K ^a   Vaudin, Mark D ^a   Lee, Byeong W ^a   Bonnell, David W ^a   Hastie, John W ^a   Paul, Albert J ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM TITANATE; CHARGE COUPLED DEVICES; EMISSION SPECTROSCOPY; IMAGING TECHNIQUES; LATTICE CONSTANTS; LEAD COMPOUNDS; MASS SPECTROMETERS; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY ANALYSIS;

INTENSIFIED CHARGE COUPLED DEVICE (ICCD); MOLECULAR BEAM SAMPLING MASS SPECTROMETRY; OPTICAL MULTICHANNEL EMISSION SPECTROSCOPY; PULSED EXCIMER LASER DEPOSITION;

FERROELECTRIC MATERIALS;

EID: 0029223506     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)