Photoassisted dry etching of GaN

Applied Physics Letters

Volumn 68, Issue 6, 1996, Pages 794-796

  Leonard, R T ^a   Bedair, S M ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; EXCIMER LASERS; HYDROCHLORIC ACID; OPTICAL MICROSCOPY; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; VACUUM;

ETCH FEATURES; GALLIUM NITRIDE; PHOTOASSISTED ETCHING; PROFILOMETRY; PROJECTED PATTERNING;

SEMICONDUCTING GALLIUM COMPOUNDS;

EID: 0030569846     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116535     Document Type: Article

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