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1
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7044263277
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1. Several excellent reviews highlighting advances in combinatorial chemistry have been published recently. These include a) Thompson, L. A.; Ellman, J. A. Chem. Rev. 1996, 96 , 555.
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Chem. Rev.
, vol.96
, pp. 555
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Thompson, L.A.1
Ellman, J.A.2
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2
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0000960658
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b) Special issue on combinatorial chemistry, Acc. Chem. Res , 1996, 29 , 111.
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Acc. Chem. Res
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, pp. 111
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3
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33748237769
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c) Fruchtel, J. S.; Jung, G. Angew. Chem. Int. Ed. Engl. 1996, 35 , 17. For solution-phase approaches to combinatorial chemistry see: Cheng, S.; Comer, D. D.; Williams, J. P.; Myers, P. L.; Boger, D. L. J. Am. Chem. Soc. 1996, 118 , 2567.
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Angew. Chem. Int. Ed. Engl.
, vol.35
, pp. 17
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Fruchtel, J.S.1
Jung, G.2
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4
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0029926720
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c) Fruchtel, J. S.; Jung, G. Angew. Chem. Int. Ed. Engl. 1996, 35 , 17. For solution-phase approaches to combinatorial chemistry see: Cheng, S.; Comer, D. D.; Williams, J. P.; Myers, P. L.; Boger, D. L. J. Am. Chem. Soc. 1996, 118 , 2567.
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J. Am. Chem. Soc.
, vol.118
, pp. 2567
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Cheng, S.1
Comer, D.D.2
Williams, J.P.3
Myers, P.L.4
Boger, D.L.5
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6
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0000861612
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3. Cho, N. S.; Song, K. Y.; Parkanyi, C. J. Heterocycl. Chem. 1989, 26 , 1897.
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(1989)
J. Heterocycl. Chem.
, vol.26
, pp. 1897
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Cho, N.S.1
Song, K.Y.2
Parkanyi, C.3
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7
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0027964423
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4. McDowel, R. S.; Blackburn, B. K.; Gadek, T. R.; McGee, L. R.; Rawson, T.; Reynolds, M. E.; Robarge, K. D.; Somers, T. C.; Thorsett, E. D.; Tischler, M.; Webb, R. R., II; Venuti, M. C. J. Am. Chem. Soc. 1994, 116, 5077.
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(1994)
J. Am. Chem. Soc.
, vol.116
, pp. 5077
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McDowel, R.S.1
Blackburn, B.K.2
Gadek, T.R.3
McGee, L.R.4
Rawson, T.5
Reynolds, M.E.6
Robarge, K.D.7
Somers, T.C.8
Thorsett, E.D.9
Tischler, M.10
Webb R.R. II11
Venuti, M.C.12
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8
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0011924650
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WO 9528399
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5. Aquino, C. J.; Dezube, M.; Sugg, E. E.; Sherrill, R. G.; Willson, T. M.; Szewczyk, J. R. Int. Pat. Appl. WO 9528399.
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Int. Pat. Appl.
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Aquino, C.J.1
Dezube, M.2
Sugg, E.E.3
Sherrill, R.G.4
Willson, T.M.5
Szewczyk, J.R.6
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9
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0029128552
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6. a) Boojamra, C. G.; Burow, K. M.; Ellman, J. A. J. Org. Chem. 1995, 60 , 5742.
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(1995)
J. Org. Chem.
, vol.60
, pp. 5742
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Boojamra, C.G.1
Burow, K.M.2
Ellman, J.A.3
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10
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0029146716
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b) Goff, D. A.; Zuckermann, R. N. J. Org. Chem. 1995, 60 , 5744. For an approach to this heterocycle using a novel "resin capture" strategy see : Keating, T. A.; Armstrong, R. W.; J. Am. Chem. Soc. 1996, 118 , 257.
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(1995)
J. Org. Chem.
, vol.60
, pp. 5744
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Goff, D.A.1
Zuckermann, R.N.2
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11
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0012008190
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b) Goff, D. A.; Zuckermann, R. N. J. Org. Chem. 1995, 60 , 5744. For an approach to this heterocycle using a novel "resin capture" strategy see : Keating, T. A.; Armstrong, R. W.; J. Am. Chem. Soc. 1996, 118 , 257.
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J. Am. Chem. Soc.
, vol.118
, pp. 257
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Keating, T.A.1
Armstrong, R.W.2
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13
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0011983801
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note
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8. Fmoc-anthranilic acid is commercially available from Advanced ChemTech (Louisville, KY), additional derivatives were prepared from the appropriate anthranilic acid and Fmoc-chloride.
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14
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0029361890
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9. Meyers, H. V.; Dilley, G. J.; Durgin, T. L.; Powers, S. T.; Winsinger, N. A.; Zhu, H.; Pavia, M. R. Molecular Diversity, 1995, 1, 13.
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(1995)
Molecular Diversity
, vol.1
, pp. 13
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Meyers, H.V.1
Dilley, G.J.2
Durgin, T.L.3
Powers, S.T.4
Winsinger, N.A.5
Zhu, H.6
Pavia, M.R.7
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15
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0011924814
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note
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10. Analysis by chiral chromatography (Phenomenex Chirex column, 3.2 × 250mm, 60:35:5 hexane /dichloromethane /ethanol elution mixture with integration of peak areas at 254nm) revealed partial racemization under these reaction conditions. For example, cmpds. 2 and 3 exhibited enantiomeric excess values of 77% and 56% respectively.
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16
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0011959936
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note
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6) δ 10.40 (s, 1H), 8.49 (d, 1H, J=6Hz), 7.66 (d, 1H, J=6Hz), 7.51(dd, J=8Hz, J= 1.5Hz), 7.32-7.17 (m, 6H), 7.1 (d, 1H, J= 7.5Hz), 3.90 (ddd, 1H, J=5.5Hz, J=5Hz, J=5Hz), 3.14 (dd, 1H, J= 14Hz, J=5.5Hz), 2.86 (dd, 1H, J= 14Hz, J=5Hz). Electrospray mass spectral characterization: 267 [MH+], calc. : 266.
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17
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0011924461
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note
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18 column, 4.6 × 250mm, 0-50% acetonitrile/water containing 0.1% TFA with integration of peak areas at 220nm.)
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18
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0011981810
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note
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b) yields were calculated from the weight of crude material and the initial loading level of starting Wang resin.
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