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Volumn 32, Issue 1, 1996, Pages 39-40

2×2 InGaAsP/InP laser amplifier gate switch arrays using reactive ion etching

Author keywords

Integrated optics; Optical switches; Reactive ion etching; Semiconductor optical amplifiers

Indexed keywords

CRYSTALS; DIFFUSION; FABRICATION; INTEGRATED OPTICS; LIGHT AMPLIFIERS; METALLORGANIC VAPOR PHASE EPITAXY; OPTICAL SWITCHES; OPTICAL WAVEGUIDES; REACTIVE ION ETCHING; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0030568227     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19960054     Document Type: Article
Times cited : (9)

References (4)
  • 4
    • 0030085684 scopus 로고    scopus 로고
    • Uniform and high coupling efficiency between InGaAsP/InP buried heterostructure optical amplifier and monolithically butt-coupled waveguide using reactive ion etching
    • to be published
    • AHN, J.H., OH, K.R., KIM, J.S., LEE, S.W., PYUN, K.E., and PARK, H.M.: 'Uniform and high coupling efficiency between InGaAsP/InP buried heterostructure optical amplifier and monolithically butt-coupled waveguide using reactive ion etching', to be published in IEEE Photonics Technol. Lett.
    • IEEE Photonics Technol. Lett.
    • Ahn, J.H.1    Oh, K.R.2    Kim, J.S.3    Lee, S.W.4    Pyun, K.E.5    Park, H.M.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.