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Volumn 8, Issue 2, 1996, Pages 200-202
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Uniform and high coupling efficiency between InGaAsP-InP buried heterostructure optical amplifier and monolithically butt-coupled waveguide using reactive ion etching
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IEEE
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Author keywords
[No Author keywords available]
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Indexed keywords
HETEROJUNCTIONS;
INTEGRATED CIRCUIT MANUFACTURE;
INTEGRATED OPTOELECTRONICS;
INTERFACES (MATERIALS);
MASKS;
METALLORGANIC VAPOR PHASE EPITAXY;
OPTICAL WAVEGUIDES;
REACTIVE ION ETCHING;
SEMICONDUCTING INDIUM PHOSPHIDE;
SEMICONDUCTING SILICON COMPOUNDS;
SUBSTRATES;
BURIED HETEROSTRUCTURE OPTICAL AMPLIFIER;
HIGH COUPLING EFFICIENCY;
INDIUM GALLIUM ARSENIC PHOSPHIDE;
MONOLITHICALLY BUTT COUPLED WAVEGUIDE;
PHOTONIC INTEGRATED CIRCUIT;
LIGHT AMPLIFIERS;
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EID: 0030085684
PISSN: 10411135
EISSN: None
Source Type: Journal
DOI: 10.1109/68.484240 Document Type: Article |
Times cited : (17)
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References (5)
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