Anisotropic resistivity in pulsed-laser deposited Bi 2 Sr 2 CaCu 2 O 8+δ films

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 713-716

  Li, S T ^a   Ritzer, Alfons ^a   Proyer, S ^a   Stangl, E ^a   Bauerle D ^a   Reschauer, N ^b  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b UNIVERSITY OF REGENSBURG   (Germany)

Author keywords

Anisotropy; Bi 2 Sr 2 CaCu 2 O 8+ ; Laser ablation; Resistivity; Thin films

Indexed keywords

LASER FLUENCE; PATTERNED FILMS; PULSED LASER DEPOSITION; UNPATTERNED FILMS;

ANISOTROPY; BISMUTH COMPOUNDS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CRYSTAL GROWTH; DEPOSITION; ELECTRIC CONDUCTIVITY; LASER ABLATION; LASER PULSES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACES; X RAY DIFFRACTION;

METALLIC FILMS;

EID: 0030562983     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00572-2     Document Type: Article

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