Analysis of aluminum nitride epitaxial growth by low pressure metal organic chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2257-2262

  Buggeln, R C ^a   Meyyappan, M ^a   Shamroth, S J ^a  

^a Scientific Research Associates Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030489578     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580057     Document Type: Article

References (18)

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