-
1
-
-
0000338325
-
-
Solid-State Electon., vol. 9, pp. 143-168, 1966.
-
W. M. Bullis, "Properties of gold in silicon," Solid-State Electon., vol. 9, pp. 143-168, 1966.
-
"Properties of Gold in Silicon,"
-
-
Bullis, W.M.1
-
2
-
-
0042821258
-
-
Proc. 1995 ESSDERC Conf, H. C. de Graaff and H. van Kranenburg, Eds. Gif-sur-Yvette, France: Edition Frontieres, 1995, pp. 71-74.
-
M. Valdinoci, L. Colalongo, S. Coffa, and M. Rudan, "A dynamic model of gold/platinum-doped devices," in Proc. 1995 ESSDERC Conf, H. C. de Graaff and H. van Kranenburg, Eds. Gif-sur-Yvette, France: Edition Frontieres, 1995, pp. 71-74.
-
"A Dynamic Model of Gold/platinum-doped Devices," in
-
-
Valdinoci, M.1
Colalongo, L.2
Coffa, S.3
Rudan, M.4
-
3
-
-
0018469862
-
-
Appl. Phys., vol. 50, no. 5, p. 3396, 1979.
-
S. D. Brotherton, P. Bradley, and J. Bicknell, "Electrical properties of platinum in silicon," J. Appl. Phys., vol. 50, no. 5, p. 3396, 1979.
-
"Electrical Properties of Platinum in Silicon," J.
-
-
Brotherton, S.D.1
Bradley, P.2
Bicknell, J.3
-
4
-
-
0016125131
-
-
Solid-State Electron. vol. 17, pp. 1139-1145, 1974.
-
J. A. Pals, "Properties of Au, Pt, Pd, and Rh levels in silicon measured with a constant capacitance technique," Solid-State Electron. vol. 17, pp. 1139-1145, 1974.
-
"Properties of Au, Pt, Pd, and Rh Levels in Silicon Measured with a Constant Capacitance Technique,"
-
-
Pals, J.A.1
-
5
-
-
33747734547
-
-
Alta Frequenza, vol. XL, no. 6, pp. 544-546, 1971.
-
M. Conti and A. Panchieri, "Electrical properties of platinum in silicon," Alta Frequenza, vol. XL, no. 6, pp. 544-546, 1971.
-
"Electrical Properties of Platinum in Silicon,"
-
-
Conti, M.1
Panchieri, A.2
-
6
-
-
0000578670
-
-
Appl. Phys., vol. 61, no. 3, pp. 1055-1058, 1987.
-
Y. K. Kwon, T. Ishikawa, and H. Kuwano, "Properties of platinum-associated deep levels in silicon," J. Appl. Phys., vol. 61, no. 3, pp. 1055-1058, 1987.
-
"Properties of Platinum-associated Deep Levels in Silicon," J.
-
-
Kwon, Y.K.1
Ishikawa, T.2
Kuwano, H.3
-
7
-
-
0014698413
-
-
Solid-State Electron., vol. 13, pp. 83-90, 1970.
-
H. Carchano and C. Jund, "Electrical properties of silicon doped with platinum," Solid-State Electron., vol. 13, pp. 83-90, 1970.
-
"Electrical Properties of Silicon Doped with Platinum,"
-
-
Carchano, H.1
Jund, C.2
-
8
-
-
0018036735
-
-
Solid-State Electron., vol. 21, pp. 1571-1576, 1978.
-
O. Engstrom and A. Alm, "Thermodynamical analysis of optimal recombination centers in thyristors," Solid-State Electron., vol. 21, pp. 1571-1576, 1978.
-
"Thermodynamical Analysis of Optimal Recombination Centers in Thyristors,"
-
-
Engstrom, O.1
Alm, A.2
-
9
-
-
0001669864
-
-
Phys. Rev. B, vol. 14, no. 8, p. 3539, 1976.
-
J. A. V. Vechten and C. D. Thurmond, "Entropy of ionization and temperature variation of ionization levels of defects in semiconductors," Phys. Rev. B, vol. 14, no. 8, p. 3539, 1976.
-
"Entropy of Ionization and Temperature Variation of Ionization Levels of Defects in Semiconductors,"
-
-
Vechten, J.A.V.1
Thurmond, C.D.2
-
10
-
-
0017935790
-
-
J. Appl. Phys., vol. 49, no. 2, p. 672, 1978.
-
H. I. Ralph, "The degeneracy factor of the gold acceptor level in silicon," J. Appl. Phys., vol. 49, no. 2, p. 672, 1978.
-
"The Degeneracy Factor of the Gold Acceptor Level in Silicon,"
-
-
Ralph, H.I.1
-
11
-
-
0021424939
-
-
Appl. Phys. A, vol. 34, pp. 41-47, 1984.
-
R. Kassing, L. Cohausz, P. van Staa, W. Mackert, and H. Hoffman, "Determination of the entropy-factor of the gold donor level in silicon by resistivity and DLTS measurements," Appl. Phys. A, vol. 34, pp. 41-47, 1984.
-
"Determination of the Entropy-factor of the Gold Donor Level in Silicon by Resistivity and DLTS Measurements,"
-
-
Kassing, R.1
Cohausz, L.2
Van Staa, P.3
Mackert, W.4
Hoffman, H.5
-
12
-
-
0039761714
-
-
J. Appl. Phys., vol. 68, no. 4, p. 1601, 1990.
-
S. Coffa, L. Calcagno, G. Ferla, and S. U. Campisano, "Gold implantation in n-type silicon: Entropy factor and diffusion studies," J. Appl. Phys., vol. 68, no. 4, p. 1601, 1990.
-
"Gold Implantation in N-type Silicon: Entropy Factor and Diffusion Studies,"
-
-
Coffa, S.1
Calcagno, L.2
Ferla, G.3
Campisano, S.U.4
-
13
-
-
85176528748
-
-
Appl. Phys. Lett., vol. 52, no. 7, p. 558, 1988.
-
S. Coffa, L. Calleri, L. Calcagno, S. Campisano, and G. Ferla, "Entropy factor of donor level in gold implanted silicon," Appl. Phys. Lett., vol. 52, no. 7, p. 558, 1988.
-
"Entropy Factor of Donor Level in Gold Implanted Silicon,"
-
-
Coffa, S.1
Calleri, L.2
Calcagno, L.3
Campisano, S.4
Ferla, G.5
-
14
-
-
0026103459
-
-
Appl. Phys. A, vol. 52, pp. 119-122, 1991.
-
M. F. Catania, L. Calcagno, S. Coffa, S. U. Campisano, M. Raspagliesi, and G. Ferla, "Compensating effects of platinum in n- and p-type silicon," Appl. Phys. A, vol. 52, pp. 119-122, 1991.
-
"Compensating Effects of Platinum in N- and P-type Silicon,"
-
-
Catania, M.F.1
Calcagno, L.2
Coffa, S.3
Campisano, S.U.4
Raspagliesi, M.5
Ferla, G.6
-
15
-
-
33747708618
-
-
Physics of Semiconductor Devices, 2nd ed. New York: Wiley, 1981.
-
S. M. Sze, Physics of Semiconductor Devices, 2nd ed. New York: Wiley, 1981.
-
-
-
Sze, S.M.1
-
16
-
-
33747735410
-
-
Proc. NASECODE IV Conf., J. J. H. Miller, Ed. Dublin: Boole Press, 1985, pp. 3-12.
-
G. Baccarani, R. Guerrieri, P. Ciampolini, and M. Rudan, "HFIELDS: A highly flexible 2-d semiconductor-device analysis program," in Proc. NASECODE IV Conf., J. J. H. Miller, Ed. Dublin: Boole Press, 1985, pp. 3-12.
-
"HFIELDS: a Highly Flexible 2-d Semiconductor-device Analysis Program," in
-
-
Baccarani, G.1
Guerrieri, R.2
Ciampolini, P.3
Rudan, M.4
-
17
-
-
0026994023
-
-
IEEE Trans. Electron. Devices, vol. 39, no. 1 2, pp. 2745-2749, 1992.
-
M. F. Catania, F. Frisina, N. Tavolo, G. Ferla, S. Coffa, and S. U. Campisano, "Optimization of the tradeoff between switching speed of the internal diode and on-resistance in gold- and platinum-implanted power metal-oxide-semiconductor devices," IEEE Trans. Electron. Devices, vol. 39, no. 12, pp. 2745-2749, 1992.
-
"Optimization of the Tradeoff between Switching Speed of the Internal Diode and On-resistance in Gold- and Platinum-implanted Power Metal-oxide-semiconductor Devices,"
-
-
Catania, M.F.1
Frisina, F.2
Tavolo, N.3
Ferla, G.4
Coffa, S.5
Campisano, S.U.6
-
18
-
-
0017014216
-
-
Solid-State Electron., vol. 19, pp. 857-862, 1976.
-
J. W. Slotboom and H. C. D. Graaf, "Measurements of bandgap narrowing in silicon bipolar transistors," Solid-State Electron., vol. 19, pp. 857-862, 1976.
-
"Measurements of Bandgap Narrowing in Silicon Bipolar Transistors,"
-
-
Slotboom, J.W.1
Graaf, H.C.D.2
|