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Volumn 158, Issue 2, 1996, Pages 523-527
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An enhanced technique for the characterisation of crystal lattice strains in epitaxially grown layers from X-ray diffraction profiles
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Author keywords
[No Author keywords available]
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Indexed keywords
STRAIN PROFILES;
EPITAXIAL GROWTH;
GERMANIUM ALLOYS;
LEAST SQUARES APPROXIMATIONS;
SILICON ALLOYS;
STRAIN;
X RAY DIFFRACTION ANALYSIS;
CRYSTAL LATTICES;
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EID: 0030395677
PISSN: 00318965
EISSN: None
Source Type: Journal
DOI: 10.1002/pssa.2211580219 Document Type: Article |
Times cited : (10)
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References (7)
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