Electrostatic control of mechanical quality factors for surface-micromachined lateral resonators

Journal of Micromechanics and Microengineering

Volumn 6, Issue 4, 1996, Pages 426-430

  Lee, Ki Bang ^a,b   Cho, Young Ho ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DRY ETCHING; ELECTROSTATICS; MASKS; MECHANICAL VARIABLES CONTROL; MICROELECTRONIC PROCESSING; MICROMACHINING; NATURAL FREQUENCIES; RESONATORS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON;

DAMPING GAP CHANGE; ELECTROSTATIC CONTROL; ELECTROSTATIC FORCE; MECHANICAL QUALITY FACTORS; MICROMECHANICAL RESONATORS; POLYCRYSTALLINE SILICON LAYER;

MICROELECTROMECHANICAL DEVICES;

EID: 0030364401     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/6/4/009     Document Type: Article

References (7)

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3. Roessig T, Pisano A P, Howe R T 1995 Surface-micromachined resonant force sensor Proc. ASME Dynamic Systems and Control Division 871-6
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6. Nguyen C T-C and Howe R T 1992 Quality factor control for micromechanical resonators Proc. IEDM 505-8
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