Planarization techniques for MEMS: Enabling new structures and enhancing manufacturability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3321, Issue , 1996, Pages 798-807

  Smith, James H ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

CMP; MEMS; Planarization

Indexed keywords

ACCELEROMETERS; CHEMICAL MECHANICAL POLISHING; FABRICATION; INTEGRATED CIRCUIT MANUFACTURE; MICROELECTRONICS; POLYSILICON;

MICROENGINES; PRESSURE SENSORS; TOPOGRAPHY;

MICROELECTROMECHANICAL DEVICES;

EID: 0030316679     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.305615     Document Type: Conference Paper

References (16)

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15. Polysilicon integrated microsystems: Technologies and applications
16. Embedded micromechanical devices for the monolithic integration of MEMS with CMOS