Characterization Enhancements in Resist Photospeed

Journal of the Electrochemical Society

Volumn 141, Issue 4, 1994, Pages 1034-1040

  Conley, Willard ^a   Plat, Marina ^a   Smith, Randolph ^a   Eib, Nicholas ^a  

^a IBM   (United States)

Author keywords

antireflection coatings; dissolving; light reflection; photographic process; photoresists; reaction kinetics; testing

Indexed keywords

CHARACTERIZATION; DISSOLUTION; DOSIMETRY; OPTICAL RESOLVING POWER; PHOTOGRAPHIC FILMS; PHOTOSENSITIVITY; REFRACTIVE INDEX; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE TESTING; SENSITIVITY ANALYSIS;

CHARACTERIZATION ENHANCEMENT; CONTROLLING STANDING WAVES; EXPOSURE PATTERN; PHOTOSPEED TESTING METHODS; REFLECTIVITY; RESIST CONTRAST; RESIST PHOTOSPEED;

PHOTORESISTS;

EID: 0028416712     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2054837     Document Type: Article

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