Alternate rigorous method for photolithographic simulation based on profile sampling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 334-347

  Kleemann, Bernd H ^a   Bischoff, Joerg ^a   Wong, Alfred K ^a  

^a Department of Diffractive Optics   (Germany)

Author keywords

Comparison of rigorous methods; Integral equation method; Parametrization; Photolithographic simulation; Profile sampling

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; FINITE DIFFERENCE METHOD; INTEGRAL EQUATIONS; OPTICAL RESOLVING POWER; SAMPLING;

PROFILE SAMPLING;

PHOTOLITHOGRAPHY;

EID: 0030314912     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240978     Document Type: Conference Paper

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