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Volumn 158, Issue 1, 1988, Pages 141-149
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Pressure stability in reactive magnetron sputtering
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
INDIUM COMPOUNDS - THIN FILMS;
SUBSTRATES;
INDIUM OXIDE;
REACTIVE MAGNETRON SPUTTERING;
STOICHIOMETRIC FILM;
SPUTTERING;
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EID: 0023978719
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/0040-6090(88)90310-0 Document Type: Article |
Times cited : (64)
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References (16)
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