Silicon structures for in situ characterization of atomic force microscope probe geometry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3425-3430

  Jarausch, K F ^a   Stark, T J ^a   Russell, P E ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ETCHING; GEOMETRY; ION BEAMS; POTASSIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SURFACE STRUCTURE;

FOCUSED ION BEAMS; LIQUID METAL ION SOURCE; POTASSIUM HYDROXIDE; PROBE SHAPE; TWO DIMENSIONAL;

ATOMIC FORCE MICROSCOPY;

EID: 0030289835     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588774     Document Type: Article

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