Thickness dependece of oxide wearout

Journal of the Electrochemical Society

Volumn 143, Issue 11, 1996, Pages 3736-3743

  Dumin, D J ^a  

^a CLEMSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CHARGE; ELECTRIC CURRENT MEASUREMENT; ELECTRIC DISCHARGES; ELECTRON TUNNELING; INTERFACES (MATERIALS); LEAKAGE CURRENTS; MATHEMATICAL MODELS; SEMICONDUCTING SILICON; VOLTAGE MEASUREMENT; WEAR OF MATERIALS;

BULK OXIDE TRAP DENSITIES; FLATBAND VOLTAGE SHIFTS; THICKNESS DEPENDENCE; TRAP GENERATION;

OXIDES;

EID: 0030289280     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837281     Document Type: Article

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