Three dimensional electron optical modeling of scanning tunneling microscope lithography in resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4148-4152

  Dobisz, E A ^a   Koops, H W P ^b   Perkins, F K ^a   Marrian, C R K ^a   Brandow, S L ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

^b Deutche Telekom   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CURRENT DENSITY; DIELECTRIC MATERIALS; ELECTRIC FIELDS; ELECTRONS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY;

ELECTRON ENERGY; FIELD EMITTER TIP; FOWLER-NORDHEIM EQUATION; MUNRO CODE; TIP RESIST DISTANCE; TIP SAMPLE VOLTAGE;

LITHOGRAPHY;

EID: 0030286601     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588609     Document Type: Article

References (22)

1. E. A. Dobisz and C. R. K. Marrian, Appl. Phys. Lett. 58, 2526 (1991).
2. J. W. Lyding, T. -C. Shen, J. S. Hubacek, J. R. Tucker, and G. C. Abeln, Appl. Phys. Lett. 64, 2010 (1990).
3. I. -W. Lyo and P. Avouris, Science 253, 173 (1991); M. Aono, A. Kobayashi, F. Grey, H. Uchida, and D. -H. Huang, Jpn. J. Appl. Phys. 32, 1470 (1993); D. M. Eigler and E. I. Schweizer, Nature 344, 524 (1991).
4. I. -W. Lyo and P. Avouris, Science 253, 173 (1991); M. Aono, A. Kobayashi, F. Grey, H. Uchida, and D. -H. Huang, Jpn. J. Appl. Phys. 32, 1470 (1993); D. M. Eigler and E. I. Schweizer, Nature 344, 524 (1991).
5. I. -W. Lyo and P. Avouris, Science 253, 173 (1991); M. Aono, A. Kobayashi, F. Grey, H. Uchida, and D. -H. Huang, Jpn. J. Appl. Phys. 32, 1470 (1993); D. M. Eigler and E. I. Schweizer, Nature 344, 524 (1991).
6. F. K. Perkins, E. A. Dobisz, and C. R. K. Marrian, J. Vac. Sci. Technol. B 11, 2597 (1993); C. R. K. Marrian, E. A. Dobisz, and J. A. Dagata, J. Vac. Sci. Technol. B 10, 2877 (1992).
7. F. K. Perkins, E. A. Dobisz, and C. R. K. Marrian, J. Vac. Sci. Technol. B 11, 2597 (1993); C. R. K. Marrian, E. A. Dobisz, and J. A. Dagata, J. Vac. Sci. Technol. B 10, 2877 (1992).
8. F. K. Perkins, E. A. Dobisz, S. L. Brandow, J. M. Calvert, J. E. Kosakowski, and C. R. K. Marrian, Appl. Phys. Lett. 68, 550 (1996).
9. J. A. Dagata, W, Tseng, J. Bennett, E. A. Dobisz, J. Schneir, and H. H. Harary, J. Vac. Sci. Technol. A 10, 2105 (1992); E. S. Snow, P. M. Campbell, and P. J. McMarr, Appl. Phys. Lett. 63, 749 (1993).
10. J. A. Dagata, W, Tseng, J. Bennett, E. A. Dobisz, J. Schneir, and H. H. Harary, J. Vac. Sci. Technol. A 10, 2105 (1992); E. S. Snow, P. M. Campbell, and P. J. McMarr, Appl. Phys. Lett. 63, 749 (1993).
11. R. Gomer, Field Emission and Field Ionization (Institute of Physics, New York, 1993), p. 9.
12. K. L. Jensen, E. G. Zaidman, M. A. Kodis, B. Goplen, and D. N. Smith, Theory and Simulation of a Field Emission Microtriode: Analysis and Incorporation into Macroscopic Device Characterization, NRL/FR/ 6840-95-9782, Naval Research Laboratory, Code 6840, Washington, DC 20375-5320 (1995).
13. P. Lorrain and D. R. Corson, Electromagnetic Fields and Waves (Free-man, San Francisco, 1970), pp. 150-151.
14. M. A. McCord, Ph.D. thesis, Stanford University (1987).
15. J. A. Rouse, Ph.D. thesis, University of London (1991).
16. J. A. Rouse and E. Munro, J. Vac. Sci. Technol. B 7, 1891 (1989); J. Rouse and E. Munro, Nucl. Instrum. Methods Phys. Res. A 298, 78 (1990).
17. J. A. Rouse and E. Munro, J. Vac. Sci. Technol. B 7, 1891 (1989); J. Rouse and E. Munro, Nucl. Instrum. Methods Phys. Res. A 298, 78 (1990).
18. K. H. Gaukler, R. Speidel, and F. Vorster, Optik 62, 391 (1975).
19. J. P. Ibe et al., Vac. Sci. Technol. A 8, 3570 (1990).
20. C. R. K. Marrian and E. A. Dobisz, J. Ultramicrosc. 42-44, 1309 (1992).
21. J. D. Jackson, Classical Electrodynamics (Wiley, New York, 1975), PP. 147-148.
22. H. W. P. Koops, C. Schossler, A. Kaya, and M. Weber, J. Vac. Sci. Technol. B (to be published).