Auger electron and X-ray photoelectron spectroscopy studies of oxidation of tin using SnOx thin films grown by reactive ion-assisted deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 11, 1996, Pages 5820-5824

  Choi, Won Kook ^a   Cho, Jun Sik ^a   Song, Seok Kyun ^a   Jung, Hyung Jin ^a   Koh, Seok Keun ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

Electronic polarization; Oxidation state of tin; Reactive ion assisted deposition; SnOx; Stoichiometric

Indexed keywords

ATOMIC RATIO; CHEMICAL SHIFTS; ELECTRONIC POLARIZATION; OXIDATION STATE; POLYCRYSTALLINE THIN FILMS; REACTIVE ION ASSISTED DEPOSITION; TIN OXIDE FILMS;

AUGER ELECTRON SPECTROSCOPY; DEPOSITION; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRONIC DENSITY OF STATES; OXIDATION; POLARIZATION; STOICHIOMETRY; THIN FILMS; TIN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

TIN;

EID: 0030285630     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.5820     Document Type: Article

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