Stress Induced Anisotropy Effect for SAL Films in Magnetoresistive Elements

IEEE Transactions on Magnetics

Volumn 32, Issue 5 PART 1, 1996, Pages 3389-3391

  Islii, Tsutomu ^a   Suzuki, Tetsuhiro ^a   Ishiwata, Nobuyuki ^a   Yamada, Kazuhiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; COMPUTER SIMULATION; FINITE ELEMENT METHOD; MAGNETIC ANISOTROPY; MAGNETIC FIELD EFFECTS; MAGNETORESISTANCE; MAGNETOSTRICTION; MATHEMATICAL MODELS; STRESS ANALYSIS; STRESS CONCENTRATION; TENSILE STRENGTH;

ELEMENT HEIGHT DIRECTION; MICROMAGNETICS; SATURATION MAGNETOSTRICTION CONSTANT; SOFT ADJACENT LAYERS; STRESS INDUCED ANISOTROPY;

MAGNETIC THIN FILMS;

EID: 0030247667     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.538633     Document Type: Article

References (6)

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6. K. F. Young, "Finite element analysis of planar stress anisotropy and thermal behavior in thin films," IBM J. Res. Develop. , vol. 034,pp 706-717, . 1990.