Fine-tuning of the focal residue in exit-wave reconstruction

Ultramicroscopy

Volumn 64, Issue 1-4, 1996, Pages 265-276

  Tang, D ^a,c   Zandbergen, H W ^a   Jansen, J ^a   Op De Beeck, M ^b   Van Dyck, D ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b UNIVERSITY OF ANTWERP   (Belgium)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; HOLOGRAPHY; IMAGE RECONSTRUCTION; OPTICAL RESOLVING POWER;

EXIT-WAVE RECONSTRUCTION;

ELECTRON MICROSCOPY;

ARTICLE; ELECTRON MICROSCOPY; HOLOGRAPHY; IMAGE RECONSTRUCTION;

EID: 0030221538     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/0304-3991(96)00041-1     Document Type: Article

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