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Volumn 69, Issue 11, 1992, Pages 1636-1639
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Using light as a lens for submicron, neutral-atom lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 11944275587
PISSN: 00319007
EISSN: None
Source Type: Journal
DOI: 10.1103/PhysRevLett.69.1636 Document Type: Article |
Times cited : (395)
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References (9)
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