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Volumn 69, Issue 11, 1992, Pages 1636-1639

Using light as a lens for submicron, neutral-atom lithography

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[No Author keywords available]

Indexed keywords


EID: 11944275587     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.69.1636     Document Type: Article
Times cited : (395)

References (9)
  • 3
    • 3643108094 scopus 로고
    • In contrast with work by P. E. Moskowitz et al. [, ] and by O. Carnal et al. [, Phys. Rev. Lett., 67, 3231, ], quantum-mechanical focusing is negligible under our experimental conditions.
    • (1983) Phys. Rev. Lett. , vol.51 , pp. 370
  • 7
    • 84927439722 scopus 로고    scopus 로고
    • The diffusive aberrations associated with force fluctuations are small because for short ti the diffusion is faster in velocity space than in real space. We have simulated the effect of fluctuations using our experimental parameters and a spatially independent diffusion coefficient of 10-45 in SI units (the maximum value [1] that should occur within λ / 2) and find a linewidth broadened by 4 nm.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.