The effects of alloying elements on the passivity of sputter-deposited amorphous Al-Cr-Mo alloys in 1 M HCl

Corrosion Science

Volumn 38, Issue 8, 1996, Pages 1281-1294

  Akiyama, E ^a   Kawashima, A ^a   Asami, K ^a   Hashimoto, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

A. alloy; C. amorphous structures; C. passivity

Indexed keywords

ADDITION REACTIONS; ALLOYING ELEMENTS; ALUMINUM ALLOYS; ANODIC POLARIZATION; CHROMIUM; COMPOSITION; CURRENT DENSITY; HYDROCHLORIC ACID; MOLYBDENUM; PASSIVATION; PITTING; PROTECTIVE COATINGS;

ALUMINUM CHROMIUM ALLOYS; ANODIC CURRENT DENSITY; ELECTROCHEMICAL MEASUREMENTS; OPEN CIRCUIT POTENTIAL; PASSIVE CURRENT DENSITY; PASSIVITY; SPUTTER DEPOSITED AMORPHOUS ALUMINUM ALLOYS; TRANSPASSIVE DISSOLUTION;

CORROSION RESISTANCE;

ALLOYS; CORROSION;

EID: 0030208659     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0010-938X(96)00017-0     Document Type: Article

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