The corrosion behavior of sputter-deposited amorphous Al-Cr-Mo alloys in 1 M HCl

Corrosion Science

Volumn 38, Issue 2, 1996, Pages 279-292

  Akiyama, E ^a   Kawashima, A ^a   Asami, K ^a   Hashimoto, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

B. XPS; C. Amorphous structures; C. Passive films; C. Pitting corrosion; C. Sputtered films

Indexed keywords

ALUMINUM ALLOYS; AMORPHOUS ALLOYS; BINARY ALLOYS; CHROMIUM; CORROSION RESISTANCE; CURRENT DENSITY; ELECTROCHEMISTRY; HYDROCHLORIC ACID; MOLYBDENUM; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM CHROMIUM MOLYBDENUM ALLOYS; CORROSION TESTS; ELECTROCHEMICAL MEASUREMENTS; OPEN CIRCUIT POTENTIALS; PASSIVE CURRENT DENSITY; PASSIVE FILMS; PITTING CORROSION; SPUTTERED FILMS;

PITTING;

ALUMINIUM ALLOYS; ALUMINIUM/CHROMIUM/MOLYBDENUM; FILMS; PITTING CORROSION; SPUTTERED;

EID: 0030072064     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0010-938X(96)00119-9     Document Type: Article

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