-
1
-
-
0026852069
-
A high performance 0.25μm CMOS technology. I. Design and characterization
-
W.H. Chang, B. Davari, M.R. Wordeman, Y. Taur, C.C. Hsu, M.D. Rodriguez, "A high performance 0.25μm CMOS technology. I. Design and characterization", IEEE Tram. El. Devices, Vol. ED-39, p. 959 (1992)
-
(1992)
IEEE Tram. El. Devices
, vol.ED-39
, pp. 959
-
-
Chang, W.H.1
Davari, B.2
Wordeman, M.R.3
Taur, Y.4
Hsu, C.C.5
Rodriguez, M.D.6
-
2
-
-
0016116644
-
Design of ion-implanted MOSFETs with very small physical dimensions
-
R.H. Dennard, F.H. GaenssLen, H.N. Yu, V.L. Rideout, E. Bassous, A. R. LeBlanc, "Design of ion-implanted MOSFETs with very small physical dimensions", IEEE J. Solid-State Circuits., Vol. SC-9, p. 256 (1974).
-
(1974)
IEEE J. Solid-State Circuits.
, vol.SC-9
, pp. 256
-
-
Dennard, R.H.1
Gaensslen, F.H.2
Yu, H.N.3
Rideout, V.L.4
Bassous, E.5
LeBlanc, A.R.6
-
3
-
-
0042026524
-
ASIC family crams up to 1.2M usable gates/chip
-
D. Bursky, "ASIC family crams up to 1.2M usable gates/chip", Electronic Design, Vol. 41, p. 111 (1993).
-
(1993)
Electronic Design
, vol.41
, pp. 111
-
-
Bursky, D.1
-
4
-
-
85008051623
-
A high performance 0.15μm CMOS
-
G.G. Shahidi, J. Warnock, A. Acovic, P. Agnello, C. Blair, T. Bucelot, A. Burghartz, E. Crabbe, J. Cressler, P. Coane, J. Comfort, B. Davari, S. Fischer, E. Ganin, S. Gittleman, J. Keller, K. Jenkins, D. Klaus, K. Kiewtniak, T. Lii, P.A. McFarland, T. Ning, M. Polcari, S. Subbana, J.Y. Sun, D. Sunderland, A.C. Warren, C. Wong, "A high performance 0.15μm CMOS", Tech. Dig. Symp. VLSI Tech. 1993, p. 93 (1993).
-
(1993)
Tech. Dig. Symp. VLSI Tech. 1993
, pp. 93
-
-
Shahidi, G.G.1
Warnock, J.2
Acovic, A.3
Agnello, P.4
Blair, C.5
Bucelot, T.6
Burghartz, A.7
Crabbe, E.8
Cressler, J.9
Coane, P.10
Comfort, J.11
Davari, B.12
Fischer, S.13
Ganin, E.14
Gittleman, S.15
Keller, J.16
Jenkins, K.17
Klaus, D.18
Kiewtniak, K.19
Lii, T.20
McFarland, P.A.21
Ning, T.22
Polcari, M.23
Subbana, S.24
Sun, J.Y.25
Sunderland, D.26
Warren, A.C.27
Wong, C.28
more..
-
6
-
-
0021482804
-
Hot-electron-induced photon and photocarrier generation in silicon MOSFET's
-
S. Tam, C. Hu, "Hot-electron-induced photon and photocarrier generation in silicon MOSFET's", IEEE Trans. Electron Devices, Vol. ED-31, p. 1264 (1984).
-
(1984)
IEEE Trans. Electron Devices
, vol.ED-31
, pp. 1264
-
-
Tam, S.1
Hu, C.2
-
7
-
-
84945713471
-
Hot-electron-induced MOSFET degradation-model, monitor, and improvement
-
C. Hu, S.C. Tam, F.-C. Hsu, P.-K. Ko, T.-Y. Chan, K.W. Terrill, "Hot-electron-induced MOSFET degradation-Model, monitor, and improvement", IEEE Trans. Electron Devices, Vol. ED-32, p. 375 (1985).
-
(1985)
IEEE Trans. Electron Devices
, vol.ED-32
, pp. 375
-
-
Hu, C.1
Tam, S.C.2
Hsu, F.-C.3
Ko, P.-K.4
Chan, T.-Y.5
Terrill, K.W.6
-
8
-
-
0020203740
-
Short-channel MOS transistors in the avalanchemultiplication regime
-
W. Muller, L. Risch, A. Schutz, "Short-channel MOS transistors in the avalanchemultiplication regime", IEEE Trans. Electron Devices, Vol. ED-29, p.1778 (1982).
-
(1982)
IEEE Trans. Electron Devices
, vol.ED-29
, pp. 1778
-
-
Muller, W.1
Risch, L.2
Schutz, A.3
-
9
-
-
0020205140
-
An analytical breakdown model for short-channel MOSFETV
-
F.-C. Hsu, P.-K. Ko, S. Tam, C. Hu, R.S. Muller, "An analytical breakdown model for short-channel MOSFETV, IEEE Trans. Electron Devices, Vol. ED-29, p. 1735 (1982).
-
(1982)
IEEE Trans. Electron Devices
, vol.ED-29
, pp. 1735
-
-
Hsu, F.-C.1
Ko, P.-K.2
Tam, S.3
Hu, C.4
Muller, R.S.5
-
10
-
-
0020098857
-
A two-dimensional model of the avalanche effect in MOS transistors
-
A. Schutz, S. Selberherr, H.W. Potzl, "A two-dimensional model of the avalanche effect in MOS transistors", Solid State Electronics, Vol. 25, p. 177 (1982).
-
(1982)
Solid State Electronics
, vol.25
, pp. 177
-
-
Schutz, A.1
Selberherr, S.2
Potzl, H.W.3
-
12
-
-
0022754998
-
Evaluation of hot-carrier degradation of n-channel MOSFETs with the charge pumping technique
-
P. Heremans, H.E. Maes, N. Saks, "Evaluation of hot-carrier degradation of n-channel MOSFETs with the charge pumping technique", IEEE Elec. Dev. Let., Vol. ED-7, p. 428 (1986). See also: G. Groeseneken, H.E. Maes, N. Beltran, R. F. De Keersmaecker, "A reliable approach to charge-pumping measurements in MOS transistors", IEEE Trans. Electron Devices, Vol. ED-31, p.42 (1984).
-
(1986)
IEEE Elec. Dev. Let.
, vol.ED-7
, pp. 428
-
-
Heremans, P.1
Maes, H.E.2
Saks, N.3
-
13
-
-
0021201529
-
A reliable approach to charge-pumping measurements in MOS transistors
-
P. Heremans, H.E. Maes, N. Saks, "Evaluation of hot-carrier degradation of n-channel MOSFETs with the charge pumping technique", IEEE Elec. Dev. Let., Vol. ED-7, p. 428 (1986). See also: G. Groeseneken, H.E. Maes, N. Beltran, R. F. De Keersmaecker, "A reliable approach to charge-pumping measurements in MOS transistors", IEEE Trans. Electron Devices, Vol. ED-31, p.42 (1984).
-
(1984)
IEEE Trans. Electron Devices
, vol.ED-31
, pp. 42
-
-
Groeseneken, G.1
Maes, H.E.2
Beltran, N.3
De Keersmaecker, R.F.4
-
14
-
-
0019664378
-
A unified model for hot-electron currents in MOSFET's
-
P.K. Ko, C. Hu, R.S. Muller, "A unified model for hot-electron currents in MOSFET's", in IEDM'81 Tech. Dig., p. 600 (1981).
-
(1981)
IEDM'81 Tech. Dig.
, pp. 600
-
-
Ko, P.K.1
Hu, C.2
Muller, R.S.3
-
15
-
-
0021601456
-
A simple method to characterize substrate current in MOSFET's
-
T.Y. Chan, P.K. Ko, C. Hu, "A simple method to characterize substrate current in MOSFET's", IEEE Electron Devices Lett., Vol. EDL-5, p. 505 (1984).
-
(1984)
IEEE Electron Devices Lett.
, vol.EDL-5
, pp. 505
-
-
Chan, T.Y.1
Ko, P.K.2
Hu, C.3
-
16
-
-
0020764471
-
Comparison of characteristics of n-channel and p-channel MOSFETs for VLSI
-
E. Takeda, Y. Nakagome, H. Kume, N. Suzuki, S. Asai, "Comparison of characteristics of n-channel and p-channel MOSFETs for VLSI", IEEE Trans. Electron Devices, Vol. ED-30, p. 675 (1983).
-
(1983)
IEEE Trans. Electron Devices
, vol.ED-30
, pp. 675
-
-
Takeda, E.1
Nakagome, Y.2
Kume, H.3
Suzuki, N.4
Asai, S.5
-
17
-
-
0014705867
-
Transport equations for two-valley semiconductors
-
K. Blotekjaer, "Transport equations for two-valley semiconductors", IEEE Trans. Electron Devices, Vol. ED-17, p. 38 (1970).
-
(1970)
IEEE Trans. Electron Devices
, vol.ED-17
, pp. 38
-
-
Blotekjaer, K.1
-
18
-
-
0024173323
-
Consistent gate and substrate current modeling based on energy transport and the lucky electron concept
-
B. Meinherzhagen, "Consistent gate and substrate current modeling based on energy transport and the lucky electron concept", Proc. IEDM'88, p. 504 (1988).
-
(1988)
Proc. IEDM'88
, pp. 504
-
-
Meinherzhagen, B.1
-
19
-
-
0000263622
-
The hot-carrier problem in small semiconductor devices
-
W. Hänsen, M. Miura-Mattausch, "The hot-carrier problem in small semiconductor devices", J. Appl. Phys, Vol. 60, p. 650 (1986).
-
(1986)
J. Appl. Phys
, vol.60
, pp. 650
-
-
Hänsen, W.1
Miura-Mattausch, M.2
-
20
-
-
0023349450
-
MINIMOS-3: A MOSFET simulator that includes energy balance
-
W. Hänsch, S. Selberherr, "MINIMOS-3: a MOSFET simulator that includes energy balance", IEEE Trans. Electron Devices, Vol. ED-34, p. 1074 (1987).
-
(1987)
IEEE Trans. Electron Devices
, vol.ED-34
, pp. 1074
-
-
Hänsch, W.1
Selberherr, S.2
-
21
-
-
0023120899
-
Substrate current at cryogenic temperatures: Measurements and a two-dimensional model for CMOS technology
-
A.K. Henning, N.N. Chan, J.T. Watt, J.D. Plummer, "Substrate current at cryogenic temperatures: measurements and a two-dimensional model for CMOS technology, IEEE Trans. Electron Devices, Vol. ED-34, p. 64 (1985).
-
(1985)
IEEE Trans. Electron Devices
, vol.ED-34
, pp. 64
-
-
Henning, A.K.1
Chan, N.N.2
Watt, J.T.3
Plummer, J.D.4
-
22
-
-
0026838519
-
Numerical modeling of advanced semiconductor devices
-
W. Lee, S.E. Laux, M.V. Fischetti, G. Baccarani, A. Gnudi, J.M.C. Stork, J.A. Mandelman, E.F. Crabbé, M.R. Wordemann, F. Odeh, "Numerical modeling of advanced semiconductor devices", IBM J. Res. Develop., Vol. 36, p. 208 (1992).
-
(1992)
IBM J. Res. Develop.
, vol.36
, pp. 208
-
-
Lee, W.1
Laux, S.E.2
Fischetti, M.V.3
Baccarani, G.4
Gnudi, A.5
Stork, J.M.C.6
Mandelman, J.A.7
Crabbé, E.F.8
Wordemann, M.R.9
Odeh, F.10
-
23
-
-
84939696523
-
A hot carrier analysis of submicrometer MOSFET's
-
E. Sangiorgi, M. R. Pinto, F. Venturi, W. Fichtner, "A hot carrier analysis of submicrometer MOSFET's", IEEE Electron Devices Lett., Vol. EDL-9, p. 13 (1988).
-
(1988)
IEEE Electron Devices Lett.
, vol.EDL-9
, pp. 13
-
-
Sangiorgi, E.1
Pinto, M.R.2
Venturi, F.3
Fichtner, W.4
-
25
-
-
0026121721
-
Monte Carlo simulation of transport in technologically significant semiconductors of the diamond and zinc-blende structures-part II: Submicrometer MOSFET's
-
M. Fischetti, S. Laux, "Monte Carlo simulation of transport in technologically significant semiconductors of the diamond and zinc-blende structures-Part II: submicrometer MOSFET's", IEEE Trans. Electron Devices, Vol. ED-38, p. 650 (1991).
-
(1991)
IEEE Trans. Electron Devices
, vol.ED-38
, pp. 650
-
-
Fischetti, M.1
Laux, S.2
-
26
-
-
0024918264
-
Monte-Carlo simulation of electron heating in scaled deep submicron MOSFETs
-
F. Venturi, E. Sangiorgi, R. Brunetti, C. Jacoboni, B. Ricco, "Monte-Carlo simulation of electron heating in scaled deep submicron MOSFETs", Proc. IEDM'89, p. 485 (1989).
-
(1989)
Proc. IEDM'89
, pp. 485
-
-
Venturi, F.1
Sangiorgi, E.2
Brunetti, R.3
Jacoboni, C.4
Ricco, B.5
-
27
-
-
0025575514
-
Hot-holes generation and transport in n-MOSFETs: A Monte-Carlo investigation
-
F. Venturi, C. Fiegna, A. Abramo, E. Sangiorgi, B. Ricco, "Hot-holes generation and transport in n-MOSFETs: a Monte-Carlo investigation", Proc. IEDM'90, p. 455 (1990).
-
(1990)
Proc. IEDM'90
, pp. 455
-
-
Venturi, F.1
Fiegna, C.2
Abramo, A.3
Sangiorgi, E.4
Ricco, B.5
-
28
-
-
0022028660
-
Hot-electron and hole emission effects in short n-channel MOSFET's
-
K.R. Hofmann, C. Werner, W. Weber, G. Dorda, "Hot-electron and hole emission effects in short n-channel MOSFET's", IEEE Trans. Electron Devices, Vol. ED-32, p. 691 (1985).
-
(1985)
IEEE Trans. Electron Devices
, vol.ED-32
, pp. 691
-
-
Hofmann, K.R.1
Werner, C.2
Weber, W.3
Dorda, G.4
-
29
-
-
0019544106
-
Hot-electron injection into the oxide in n-channel MOS devices
-
B. Eitan, D. Frohman-Bentchowsky, "Hot-electron injection into the oxide in n-channel MOS devices", IEEE Trans. Electron Devices, Vol. ED-28, p. 328 (1981).
-
(1981)
IEEE Trans. Electron Devices
, vol.ED-28
, pp. 328
-
-
Eitan, B.1
Frohman-Bentchowsky, D.2
-
30
-
-
0008780580
-
Observation of hot-hole injection in NMOS transistors using a modified floating gate technique
-
N.S. Saks, P.L. Heremans, L. Van der Hove, H.E. Maes, R.F. De Keersmacker, G.J. Declerck, "Observation of hot-hole injection in NMOS transistors using a modified floating gate technique", IEEE Trans. Electron Devices, Vol. ED-33, p.1529 (1986).
-
(1986)
IEEE Trans. Electron Devices
, vol.ED-33
, pp. 1529
-
-
Saks, N.S.1
Heremans, P.L.2
Van Der Hove, L.3
Maes, H.E.4
De Keersmacker, R.F.5
Declerck, G.J.6
-
31
-
-
0022791689
-
A novel floating-gate method for measurement of ultra-low hole and electron gate currents in MOS transistors
-
Y. Nissan-Cohen, "A novel floating-gate method for measurement of ultra-low hole and electron gate currents in MOS transistors", IEEE Electron Devices Lett., Vol. EDL-7, p. 561 (1986).
-
(1986)
IEEE Electron Devices Lett.
, vol.EDL-7
, pp. 561
-
-
Nissan-Cohen, Y.1
-
32
-
-
0018456839
-
Hot-electron emission in n-channel IGFET's
-
P.E. Cotrell, R.R. Troutman, T.H. Ning, "Hot-electron emission in n-channel IGFET's", IEEE Trans. Electron Devices, Vol. ED-26, p. 520 (1979).
-
(1979)
IEEE Trans. Electron Devices
, vol.ED-26
, pp. 520
-
-
Cotrell, P.E.1
Troutman, R.R.2
Ning, T.H.3
-
33
-
-
0021483045
-
Lucky electron model of channel hot-electron silicon MOSFET's
-
S. Tam, P.K. Ko, C. Hu, "Lucky electron model of channel hot-electron silicon MOSFET's", IEEE Trans. Electron Devices, Vol. ED-31, p. 1116 (1984).
-
(1984)
IEEE Trans. Electron Devices
, vol.ED-31
, pp. 1116
-
-
Tam, S.1
Ko, P.K.2
Hu, C.3
-
34
-
-
0020208332
-
Correlation between substrate and gate currents in MOSFET's
-
S. Tam, P.-K. Ko, C. Hu, R.S. Muller, "Correlation between substrate and gate currents in MOSFET's", IEEE Trans. Electron Devices, Vol. ED-29, p. 1740 (1982).
-
(1982)
IEEE Trans. Electron Devices
, vol.ED-29
, pp. 1740
-
-
Tam, S.1
Ko, P.-K.2
Hu, C.3
Muller, R.S.4
-
35
-
-
4243316031
-
Gate currents and device degradation: Carrier transport in gate oxides of MOSFET's
-
ESSDERC'88 (Montpellier)
-
A. Schwerin, W. Haensch, "Gate currents and device degradation: carrier transport in gate oxides of MOSFET's", ESSDERC'88 (Montpellier), Proc. in Journal de physique, supplement to number 9, Vol 49, p. C4-647 (1988).
-
(1988)
Proc. in Journal de Physique
, vol.49
, Issue.9 SUPPL.
-
-
Schwerin, A.1
Haensch, W.2
-
36
-
-
25344456925
-
The hot-electron problem in submicron MOSFET
-
ESSDERC'SS
-
W. Haensch, M. Orlowski, W. Weber, "The hot-electron problem in submicron MOSFET", ESSDERC'SS, Proc. in Journal de physique, suppl. to number 9, Vol 49, p. C4-597 (1988).
-
(1988)
Proc. in Journal de Physique
, vol.49
, Issue.9 SUPPL.
-
-
Haensch, W.1
Orlowski, M.2
Weber, W.3
-
37
-
-
24444464186
-
Modeling hot-carrier reliability of MOSFETs: What is necessary and what is possible?
-
W. Hänsch, "Modeling hot-carrier reliability of MOSFETs: What is necessary and what is possible?",Proc. IEDM'92, p. 717 (1992).
-
(1992)
Proc. IEDM'92
, pp. 717
-
-
Hänsch, W.1
-
38
-
-
0023564219
-
The relationship between oxide charge and device degradation: A comparative study of n- and p-channel MOSFET's
-
A. v. Schwerin, W. Haensch, W. Werner, "The relationship between oxide charge and device degradation: a comparative study of n-and p-channel MOSFET's", IEEE Trans. Electron Devices, Vol. ED-34, p. 2493 (1987).
-
(1987)
IEEE Trans. Electron Devices
, vol.ED-34
, pp. 2493
-
-
Schwerin, A.V.1
Haensch, W.2
Werner, W.3
-
39
-
-
0024124856
-
Consistent model for hot-carrier degradation in n-channel and p-channel MOSFET's
-
P. Heremans, R. Bellens, G. Groeseneken, H.E. Maes, "Consistent model for hot-carrier degradation in n-channel and p-channel MOSFET's", IEEE Trans. Electron Devices, Vol. ED-35, p. 2194 (1988).
-
(1988)
IEEE Trans. Electron Devices
, vol.ED-35
, pp. 2194
-
-
Heremans, P.1
Bellens, R.2
Groeseneken, G.3
Maes, H.E.4
-
41
-
-
0017908429
-
Hot-electron emission from silicon into silicon dioxide
-
T.H. Ning, "Hot-electron emission from silicon into silicon dioxide", Solid State Electr., Vol. 21, p. 273 (1978).
-
(1978)
Solid State Electr.
, vol.21
, pp. 273
-
-
Ning, T.H.1
-
42
-
-
0025380961
-
Models and experiments on degradation of oxidized silicon
-
C.T. Sah, "Models and experiments on degradation of oxidized silicon", Solid State Electronics, Vol 33, p. 147 (1990).
-
(1990)
Solid State Electronics
, vol.33
, pp. 147
-
-
Sah, C.T.1
-
43
-
-
0043028359
-
Degradation of 77K MOSFET characteristics due to channel hot-electron
-
J.Y.-C. Sun, M.R. Wordeman, "Degradation of 77K MOSFET characteristics due to channel hot-electron", IEEE Trans. Electron Devices, Vol. ED-31, p. 1970 (1984).
-
(1984)
IEEE Trans. Electron Devices
, vol.ED-31
, pp. 1970
-
-
Sun, J.Y.-C.1
Wordeman, M.R.2
-
44
-
-
0041525452
-
Simulation of aging effects in MOS transistors
-
G. Soncini (eds)
-
N. Bergonzoni, B. Doyle, "Simulation of aging effects in MOS transistors", Proc. ESSDERC'87 (Bologna), G. Soncini (eds), p.721 (1987).
-
(1987)
Proc. ESSDERC'87 (Bologna)
, pp. 721
-
-
Bergonzoni, N.1
Doyle, B.2
-
45
-
-
0024705114
-
Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradation
-
P. Heremans, J. Witters, G. Groeseneken, H.E. Maes, "Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradation", IEEE Trans. Electron Devices, Vol. ED-36, p. 1318 (1989).
-
(1989)
IEEE Trans. Electron Devices
, vol.ED-36
, pp. 1318
-
-
Heremans, P.1
Witters, J.2
Groeseneken, G.3
Maes, H.E.4
-
46
-
-
0025474204
-
The generation and characterization of electron and hole traps created by injection during low gate voltage hot-carrier stressing of n-MOS transistors
-
B.S. Doyle, M. Bourcerie, C. Bergonzoni, R. Benecchi, A. Bravis, K.R. Mistry, A. Boudou, "The generation and characterization of electron and hole traps created by injection during low gate voltage hot-carrier stressing of n-MOS transistors", IEEE Trans. Electron Devices, Vol. ED-37, p. 1869 (1990).
-
(1990)
IEEE Trans. Electron Devices
, vol.ED-37
, pp. 1869
-
-
Doyle, B.S.1
Bourcerie, M.2
Bergonzoni, C.3
Benecchi, R.4
Bravis, A.5
Mistry, K.R.6
Boudou, A.7
-
47
-
-
0003164115
-
Two carrier nature of interface state generation in hole trapping and radiation damage
-
S.K. Lai, "Two carrier nature of interface state generation in hole trapping and radiation damage", Appl. Phys. lett., Vol. 38, p. 58 (1981).
-
(1981)
Appl. Phys. Lett.
, vol.38
, pp. 58
-
-
Lai, S.K.1
-
49
-
-
0000532107
-
Hot-carrier-induced degradation of metal-oxide-semiconductor field-effect transistors: Oxide charge versus interface traps
-
J. Y Choi, P.K. Ko, C. Hu, W. Scott, "Hot-carrier-induced degradation of metal-oxide-semiconductor field-effect transistors: oxide charge versus interface traps", J. Appl. Phys., Vol. 65, p.354 (1989).
-
(1989)
J. Appl. Phys.
, vol.65
, pp. 354
-
-
Choi, J.Y.1
Ko, P.K.2
Hu, C.3
Scott, W.4
-
50
-
-
0022957458
-
Investigation and reduction of hot-electron induced punchthrough (HEIP) effect in submicron PMOSFETs
-
M. Koyanagi, A.G. Lewis, J. Zhu, R.A. Martin, T.Y. Huang, J.Y. Chen, " Investigation and reduction of hot-electron induced punchthrough (HEIP) effect in submicron PMOSFETs", in IEDM Tech. Dig., p. 722 (1986).
-
(1986)
IEDM Tech. Dig.
, pp. 722
-
-
Koyanagi, M.1
Lewis, A.G.2
Zhu, J.3
Martin, R.A.4
Huang, T.Y.5
Chen, J.Y.6
-
51
-
-
0025578249
-
A new monitor to predict hot-carrier damage of PMOS transistors
-
R. Woltjer, G.M. Paulzen, "A new monitor to predict hot-carrier damage of PMOS transistors", Proc. IEDM'90, p. 561.
-
Proc. IEDM'90
, pp. 561
-
-
Woltjer, R.1
Paulzen, G.M.2
-
52
-
-
84954124396
-
A physical lifetime prediction method for hot-carrier stressed p-mos transistors
-
M. Brox, E. Wohlrab, W. Weber, "A physical lifetime prediction method for hot-carrier stressed p-mos transistors", in IEDM'91 Tech. Dig., p. 525 (1991). See also: Q. Wang, M. Brox, W.H. Krautenschnieder, W. Weber, "Explanation and model for the logarithmic time dependence of p-MOSFET degradation", IEEE Electron Devices Lett., Vol. EDL-12, p. 218 (1991).
-
(1991)
IEDM'91 Tech. Dig.
, pp. 525
-
-
Brox, M.1
Wohlrab, E.2
Weber, W.3
-
53
-
-
0026155539
-
Explanation and model for the logarithmic time dependence of p-MOSFET degradation
-
M. Brox, E. Wohlrab, W. Weber, "A physical lifetime prediction method for hot-carrier stressed p-mos transistors", in IEDM'91 Tech. Dig., p. 525 (1991). See also: Q. Wang, M. Brox, W.H. Krautenschnieder, W. Weber, "Explanation and model for the logarithmic time dependence of p-MOSFET degradation", IEEE Electron Devices Lett., Vol. EDL-12, p. 218 (1991).
-
(1991)
IEEE Electron Devices Lett.
, vol.EDL-12
, pp. 218
-
-
Wang, Q.1
Brox, M.2
Krautenschnieder, W.H.3
Weber, W.4
-
54
-
-
0027814765
-
Oxide-charge generation during hot-carrier degradation of PMOSs
-
R. Woltjer, G.M. Paulzen, "Oxide-charge generation during hot-carrier degradation of PMOSs", Proc. IEDM'9S, p. 713.
-
Proc. IEDM'9s
, pp. 713
-
-
Woltjer, R.1
Paulzen, G.M.2
-
55
-
-
0027542095
-
Time dependence of p-MOSFET hot-carrier degradation measured and interpreted consistently over ten orders of magnitude
-
R. Woltjer, A. Hamada, E. Takeda, "Time dependence of p-MOSFET hot-carrier degradation measured and interpreted consistently over ten orders of magnitude", IEEE Trans. Electron Devices, Vol. ED-40, p. 392 (1993).
-
(1993)
IEEE Trans. Electron Devices
, vol.ED-40
, pp. 392
-
-
Woltjer, R.1
Hamada, A.2
Takeda, E.3
-
56
-
-
0042527344
-
Hot carrier degradation of 0.5μ surface and buried channel PMOSFETs
-
K. Mitsui, M. Inushui, S. Kusunoki, H. Oda, K. Tsukamoto, "Hot carrier degradation of 0.5μ surface and buried channel PMOSFETs", Ext. Abstr. SSDM'89, p. 473 (1989).
-
(1989)
Ext. Abstr. SSDM'89
, pp. 473
-
-
Mitsui, K.1
Inushui, M.2
Kusunoki, S.3
Oda, H.4
Tsukamoto, K.5
-
58
-
-
0022754226
-
Measurement and analysis of hot-carrier-stress effect on n-channel MOSFET's using substrate current characterization
-
Y. Nissan-Cohen, G.A. Franz, R.F. Kwasnick, "Measurement and analysis of hot-carrier-stress effect on n-channel MOSFET's using substrate current characterization", IEEE Electron Devices Lett., Vol. EDL-7, p. 451 (1986).
-
(1986)
IEEE Electron Devices Lett.
, vol.EDL-7
, pp. 451
-
-
Nissan-Cohen, Y.1
Franz, G.A.2
Kwasnick, R.F.3
-
59
-
-
0042527338
-
Characterization of degradation due to hot-carriers in MOSFETs by the drain-substrate gate controlled tunnel diode
-
ESSDERC'87 Extend. Proc. G. Soncini and P.U. Calzolari (eds.), Elsevier, Amsterdam
-
A. Acovic, M. Ilegems, "Characterization of degradation due to hot-carriers in MOSFETs by the drain-substrate gate controlled tunnel diode", Solid State Devices, (ESSDERC'87 Extend. Proc.) G. Soncini and P.U. Calzolari (eds.), (Elsevier, Amsterdam 1988).
-
(1988)
Solid State Devices
-
-
Acovic, A.1
Ilegems, M.2
-
60
-
-
0025448159
-
Characterization of hot-electron stressed MOSFETs by low temperature measurements of the drain tunnel current
-
A. Acovic, M. Dutoit, M. Ilegems, "Characterization of hot-electron stressed MOSFETs by low temperature measurements of the drain tunnel current", IEEE Trans. El. Dev., Vol. 37, p. 1467 (1990).
-
(1990)
IEEE Trans. El. Dev.
, vol.37
, pp. 1467
-
-
Acovic, A.1
Dutoit, M.2
Ilegems, M.3
-
61
-
-
0023566392
-
Hot carrier induced drain leakage current in n-channel MOSFETs
-
H. Sasaki, M. Saitoh, K. Hashimoto, "Hot carrier induced drain leakage current in n-channel MOSFETs", in IEDM Tech. Dig., p.726 (1987).
-
(1987)
IEDM Tech. Dig.
, pp. 726
-
-
Sasaki, H.1
Saitoh, M.2
Hashimoto, K.3
-
62
-
-
34250798651
-
Interface-trap enhanced gate-induced leakage current in MOSFET
-
I.C. Chen, C.W. Teng, D.J. Coleman, A. Nishimura, "Interface-Trap enhanced gate-induced leakage current in MOSFET", IEEE Electron Devices Lett., Vol. EDL-10, p. 216 (1989).
-
(1989)
IEEE Electron Devices Lett.
, vol.EDL-10
, pp. 216
-
-
Chen, I.C.1
Teng, C.W.2
Coleman, D.J.3
Nishimura, A.4
-
63
-
-
84870656847
-
New device degradation due to "cold" carriers created by band-to-band tunneling
-
Y. Igura, H. Matsuoka, E. Takeda, "New device degradation due to "cold" carriers created by band-to-band tunneling", IEEE Electron Devices Lett., Vol. EDL-10, p. 227 (1989).
-
(1989)
IEEE Electron Devices Lett.
, vol.EDL-10
, pp. 227
-
-
Igura, Y.1
Matsuoka, H.2
Takeda, E.3
-
64
-
-
0024700058
-
Gate current injection initiated by electron band-to-band tunneling in MOS devices
-
I.C. Chen, D.J. Coleman, C.W. Teng, "Gate current injection initiated by electron band-to-band tunneling in MOS devices", IEEE Electron Devices Lett., Vol. EDL-10, p. 297 (1989).
-
(1989)
IEEE Electron Devices Lett.
, vol.EDL-10
, pp. 297
-
-
Chen, I.C.1
Coleman, D.J.2
Teng, C.W.3
-
65
-
-
0024124290
-
The effect of channel hot-carrier stressing on gate oxide integrity in MOSFET
-
I.C. Chen, J.Y. Choi, T.Y. Chan, TY.C. Ong, C. Hu, "The effect of channel hot-carrier stressing on gate oxide integrity in MOSFET", IEEE Trans. El. Devices, Vol. ED-35, p. 2253 (1988).
-
(1988)
IEEE Trans. El. Devices
, vol.ED-35
, pp. 2253
-
-
Chen, I.C.1
Choi, J.Y.2
Chan, T.Y.3
Ong, T.Y.C.4
Hu, C.5
-
66
-
-
0026257527
-
Effects of hot-carrier injection on n- and p-MOSFET gate oxide integrity
-
E. Rosenbaum, R. Rofan, C. Hu, "Effects of hot-carrier injection on n-and p-MOSFET gate oxide integrity", IEEE Electron Devices Lett., Vol. EDL-12, p. 599 (1991).
-
(1991)
IEEE Electron Devices Lett.
, vol.EDL-12
, pp. 599
-
-
Rosenbaum, E.1
Rofan, R.2
Hu, C.3
-
67
-
-
0028430427
-
2 breakdown model for very low voltage lifetime extrapolation
-
2 breakdown model for very low voltage lifetime extrapolation", IEEE Trans. Electron Devices, Vol. ED-41, p. 761 (1994).
-
(1994)
IEEE Trans. Electron Devices
, vol.ED-41
, pp. 761
-
-
Schuegraf, K.F.1
Hu, C.2
-
68
-
-
0026116660
-
Gate-oxide breakdown accelerated by large drain current in n-channel MOSFET's
-
Y. Nishioka, Y. Ohji, T.P. Ma, "Gate-oxide breakdown accelerated by large drain current in n-channel MOSFET's", IEEE Electron Devices Lett., Vol. EDL-12, p. 134 (1991).
-
(1991)
IEEE Electron Devices Lett.
, vol.EDL-12
, pp. 134
-
-
Nishioka, Y.1
Ohji, Y.2
Ma, T.P.3
-
69
-
-
0024178560
-
Flicker noise characteristics of advanced MOS technologies
-
K.K. Hung, P.K. Ko, C. Hu, Y.C. Cheng, "Flicker noise characteristics of advanced MOS technologies", Proc. IEDM'88, p. 34 (1988).
-
(1988)
Proc. IEDM'88
, pp. 34
-
-
Hung, K.K.1
Ko, P.K.2
Hu, C.3
Cheng, Y.C.4
-
70
-
-
0023981086
-
On the effects of hot-carrier stressing on MOSFET terminal capacitances
-
C.T. Yao, M. Peckerar, D. Friedman, H. Hughes, "On the effects of hot-carrier stressing on MOSFET terminal capacitances", IEEE Trans. Electron Devices, Vol. ED-35, p.384 (1988).
-
(1988)
IEEE Trans. Electron Devices
, vol.ED-35
, pp. 384
-
-
Yao, C.T.1
Peckerar, M.2
Friedman, D.3
Hughes, H.4
-
71
-
-
0025462473
-
Parameter correlation and modeling of the power law relationship in MOSFET hot-carrier degradation
-
S.W. Sun, M. Orlowski, K.-Y. Fu, "Parameter correlation and modeling of the power law relationship in MOSFET hot-carrier degradation", IEEE Electron Devices Lett., Vol. EDL-11, p. 297 (1990).
-
(1990)
IEEE Electron Devices Lett.
, vol.EDL-11
, pp. 297
-
-
Sun, S.W.1
Orlowski, M.2
Fu, K.-Y.3
-
72
-
-
0028319398
-
Improved prediction of interface-trap generation in NMOSTs
-
R. Woltjer, G.M. Paulzen, "Improved prediction of interface-trap generation in NMOSTs", IEEE Electr. Dev. Let., Vol. EDL-15, p. 4 (1994).
-
(1994)
IEEE Electr. Dev. Let.
, vol.EDL-15
, pp. 4
-
-
Woltjer, R.1
Paulzen, G.M.2
-
73
-
-
0026954183
-
An analytical model for self-limiting behavior of hot-carrier degradation in 0.25μm n-MOSFETs
-
C. Liang, H. Gaw, P. Cheng, "An analytical model for self-limiting behavior of hot-carrier degradation in 0.25μm n-MOSFETs", IEEE Electron Devices Lett., Vol. EDL-11, p. 569 (1992).
-
(1992)
IEEE Electron Devices Lett.
, vol.EDL-11
, pp. 569
-
-
Liang, C.1
Gaw, H.2
Cheng, P.3
-
74
-
-
0028540082
-
Hot-carrier-induced off-state current leakage in submicrometer PMOSFETs devices
-
H. Fang, P. Fang, J.T. Yue, "Hot-carrier-induced off-state current leakage in submicrometer PMOSFETs devices", IEEE Electron Devices Lett., Vol. EDL-15, p.463 (1994).
-
(1994)
IEEE Electron Devices Lett.
, vol.EDL-15
, pp. 463
-
-
Fang, H.1
Fang, P.2
Yue, J.T.3
-
75
-
-
0025430937
-
A lifetime prediction method for hot-carrier degradation in surface-channel p-mos devices
-
B.S. Doyle, K.R. Mistry, "A lifetime prediction method for hot-carrier degradation in surface-channel p-mos devices", IEEE Trans. Electron Devices, Vol. ED-37, p. 1301 (1990).
-
(1990)
IEEE Trans. Electron Devices
, vol.ED-37
, pp. 1301
-
-
Doyle, B.S.1
Mistry, K.R.2
-
76
-
-
0021606653
-
Degradation of n-MOS transistorss after pulsed stress
-
W. Weber, C. Werner, G. Dorda, "Degradation of n-MOS transistorss after pulsed stress", IEEE Electron Devices Lett., Vol. EDL-5, p. 518 (1984).
-
(1984)
IEEE Electron Devices Lett.
, vol.EDL-5
, pp. 518
-
-
Weber, W.1
Werner, C.2
Dorda, G.3
-
77
-
-
0025233051
-
The influence of the measurement setup on enhanced ac hot-carrier degradation of MOSFET's
-
R. Bellens, P. Heremans, G. Groeseneken, H.E. Maes, W. Weber, "The influence of the measurement setup on enhanced ac hot-carrier degradation of MOSFET's", IEEE Trans. Electron Devices, Vol. ED-37, p. 310 (1990).
-
(1990)
IEEE Trans. Electron Devices
, vol.ED-37
, pp. 310
-
-
Bellens, R.1
Heremans, P.2
Groeseneken, G.3
Maes, H.E.4
Weber, W.5
-
78
-
-
0026203342
-
Dynamic degradation in MOSFET's-Part I: The physical effects
-
M. Brox, W. Weber, "Dynamic degradation in MOSFET's-Part I: the physical effects", IEEE Trans. Electron Devices, Vol. ED-38, p. 1852 (1991).
-
(1991)
IEEE Trans. Electron Devices
, vol.ED-38
, pp. 1852
-
-
Brox, M.1
Weber, W.2
-
79
-
-
0028753977
-
High-frequency AC hot-carrier degradation in CMOS circuits
-
V.-H. Chan, T.E. Kopley, P. Marcoux, J. E. Chung, "High-frequency AC hot-carrier degradation in CMOS circuits", IEDM'94 Tech. Dig., p. 299 (1994).
-
(1994)
IEDM'94 Tech. Dig.
, pp. 299
-
-
Chan, V.-H.1
Kopley, T.E.2
Marcoux, P.3
Chung, J.E.4
-
80
-
-
0028401469
-
On the hot-carrier-induced post-stress interface trap generation in n-channel MOS transistors
-
R. Bellens, E. de Schrijver, G. van den Bosch, G. Groeseneken, P. Heremans, H. E. Maes, "On the hot-carrier-induced post-stress interface trap generation in n-channel MOS transistors", IEEE Trans. Electron Devices, Vol. ED-41, p.413 (1994).
-
(1994)
IEEE Trans. Electron Devices
, vol.ED-41
, pp. 413
-
-
Bellens, R.1
De Schrijver, E.2
Van Den Bosch, G.3
Groeseneken, G.4
Heremans, P.5
Maes, H.E.6
-
81
-
-
0026206480
-
Dynamic degradation in MOSFET's-Part II: Applications in the circuit environment
-
W. Weber, M. Brox, T. Kunemund, H.-M. Muhlhoff, D. Schmitt-Landsiedel, "Dynamic degradation in MOSFET's-Part II: applications in the circuit environment", IEEE Trans. Electron Devices, Vol. ED-38, p. 1859 (1991).
-
(1991)
IEEE Trans. Electron Devices
, vol.ED-38
, pp. 1859
-
-
Weber, W.1
Brox, M.2
Kunemund, T.3
Muhlhoff, H.-M.4
Schmitt-Landsiedel, D.5
-
82
-
-
0025672516
-
Relation between the hot-carrier lifetime of transistors and CMOS SRAM products
-
J.A. van der Pol, J.J. Koomen, "Relation between the hot-carrier lifetime of transistors and CMOS SRAM products", Proc. IRPS'90 , p. 178 (1990).
-
(1990)
Proc. IRPS'90
, pp. 178
-
-
Van Der Pol, J.A.1
Koomen, J.J.2
-
83
-
-
0028426358
-
Hot carrier reliability design rules for translating device degradation to CMOS digital circuit degradation
-
P.K.
-
K.N. Quader, P. Fang, J.T. Yue, P.K. Ko, P.K., C. Hu, "Hot carrier reliability design rules for translating device degradation to CMOS digital circuit degradation", IEEE Trans. Electron Devices, Vol.ED-41, p. 681 (1994).
-
(1994)
IEEE Trans. Electron Devices
, vol.ED-41
, pp. 681
-
-
Quader, K.N.1
Fang, P.2
Yue, J.T.3
Ko, P.K.4
Hu, C.5
-
84
-
-
0023245783
-
Impact of hot-carriers on DRAM circuits
-
C. Duvvury, D. Redwine, H. Kitagawa, R. Haas, Y. Chuang, C. Beydler, A. Hyslop, "Impact of hot-carriers on DRAM circuits", IEEE Proc. IRPS'87, p.201 (1987).
-
(1987)
IEEE Proc. IRPS'87
, pp. 201
-
-
Duvvury, C.1
Redwine, D.2
Kitagawa, H.3
Haas, R.4
Chuang, Y.5
Beydler, C.6
Hyslop, A.7
-
85
-
-
0028313940
-
Voltage overshoot and N-MOSFET hot-carrier robustness in VLSI circuits
-
K.R. Mistry, R. Hokinson, B. Gieseke, T.F. Fox, R.P. Preston, B. Doyle, "Voltage overshoot and N-MOSFET hot-carrier robustness in VLSI circuits", Proc. IEEE IRPS'94, p.65 (1994).
-
(1994)
Proc. IEEE IRPS'94
, pp. 65
-
-
Mistry, K.R.1
Hokinson, R.2
Gieseke, B.3
Fox, T.F.4
Preston, R.P.5
Doyle, B.6
-
86
-
-
0027624892
-
Circuit design guidelines for n-channel MOSFET hot-carrier robustness
-
K.R. Mistry, T.F. Fox, R.P. Preston, N. D. Arora, B. Doyle, D. E. Nelsen, "Circuit design guidelines for n-channel MOSFET hot-carrier robustness", IEEE Trans. Electron Devices, Vol. ED-40, p.1284 (1993).
-
(1993)
IEEE Trans. Electron Devices
, vol.ED-40
, pp. 1284
-
-
Mistry, K.R.1
Fox, T.F.2
Preston, R.P.3
Arora, N.D.4
Doyle, B.5
Nelsen, D.E.6
-
87
-
-
0024170237
-
Circuit aging simulator (CAS)
-
P.M. Lee, M.M. Kuo, K. Seiki, P.K. Ko, C. Hu, "Circuit aging simulator (CAS)", IEDM'88 Techical Digest, p. 134 (1988).
-
(1988)
IEDM'88 Techical Digest
, pp. 134
-
-
Lee, P.M.1
Kuo, M.M.2
Seiki, K.3
Ko, P.K.4
Hu, C.5
-
88
-
-
0027595647
-
Modeling and simulation of hot-carrier-induced device degradation in MOS circuits
-
Y. Leblebici, S.-M. Kang, "Modeling and simulation of hot-carrier-induced device degradation in MOS circuits", IEEE J. Solid State Cir., Vol. 28, p.585 (1993).
-
(1993)
IEEE J. Solid State Cir.
, vol.28
, pp. 585
-
-
Leblebici, Y.1
Kang, S.-M.2
-
89
-
-
0023547463
-
Quasi-static simulation of hot-electron-induced mosfet degradation under AC (pulse) stress
-
M. Kuo, K. Seki, P.M. Lee, J.Y. Choi, P.K. Ko, C. Hu, "Quasi-static simulation of hot-electron-induced mosfet degradation under AC (pulse) stress", IEDM'87 Tech. Dig., p. 47 (1987).
-
(1987)
IEDM'87 Tech. Dig.
, pp. 47
-
-
Kuo, M.1
Seki, K.2
Lee, P.M.3
Choi, J.Y.4
Ko, P.K.5
Hu, C.6
-
90
-
-
0026173513
-
MOSFET substrate current model for circuit simulation
-
N.D. Arora, M.S. Sharma, "MOSFET substrate current model for circuit simulation", IEEE Trans. Electron Devices, Vol. ED-87, p. 1392 (1991).
-
(1991)
IEEE Trans. Electron Devices
, vol.ED-87
, pp. 1392
-
-
Arora, N.D.1
Sharma, M.S.2
-
91
-
-
0027202869
-
AC versus DC hot-carrier degradation in n-channel MOSFET's
-
K.R. Mistry, B. Doyle, "AC versus DC hot-carrier degradation in n-channel MOSFET's", IEEE Trans. Electron Devices, Vol. ED-40, p.96 (1993).
-
(1993)
IEEE Trans. Electron Devices
, vol.ED-40
, pp. 96
-
-
Mistry, K.R.1
Doyle, B.2
-
92
-
-
0025208040
-
New detection method of hot-carrier degradation using photon spectrum analysis of weak luminescence on CMOS VLSI
-
N. Tsutsu, Y. Uraoka, Y. Nakata, S. Akiyama, H. Esaki, "New detection method of hot-carrier degradation using photon spectrum analysis of weak luminescence on CMOS VLSI", Proc. IEEE 1990 Int. Conf. on Microelectronic test structures", p. 143 (1990).
-
(1990)
Proc. IEEE 1990 Int. Conf. on Microelectronic Test Structures
, pp. 143
-
-
Tsutsu, N.1
Uraoka, Y.2
Nakata, Y.3
Akiyama, S.4
Esaki, H.5
-
93
-
-
0024170167
-
New insight into hot-electron-induced degradation of n-MOSFET's
-
T.Y. Chan, C.L. Chiang, H. Gaw, "New insight into hot-electron-induced degradation of n-MOSFET's", in IEDM Tech. Dig., p. 196 (1988).
-
(1988)
IEDM Tech. Dig.
, pp. 196
-
-
Chan, T.Y.1
Chiang, C.L.2
Gaw, H.3
-
94
-
-
0025576484
-
The effects of hot-electron degradation on analog MOSFET performance
-
J. Chung, K.N. Quadder, C. G. Sodini, P.-K. Ko, C. Hu, "The effects of hot-electron degradation on analog MOSFET performance", Proc. IEDM'90, p. 553 (1990).
-
(1990)
Proc. IEDM'90
, pp. 553
-
-
Chung, J.1
Quadder, K.N.2
Sodini, C.G.3
Ko, P.-K.4
Hu, C.5
-
95
-
-
84990665930
-
Hot-carrier degradation of p-MOSFET's inanalog operation: The relevance of the channel length-independent drain conductance degradation
-
R. Thewes, M. Brox, G. Tempel. W. Weber, "Hot-carrier degradation of p-MOSFET's inanalog operation: the relevance of the channel length-independent drain conductance degradation", Proc. IEDM'92, p. 531 (1992).
-
(1992)
Proc. IEDM'92
, pp. 531
-
-
Thewes, R.1
Brox, M.2
Tempel, G.3
Weber, W.4
-
96
-
-
0023867777
-
Incompatibility of requirements for optimizing short channel behavior and long term stability in MOSFETs
-
F. Bauer, S. C. Jain, J. Korec, V. Lauer, M. Offenberg, P. Balk, "Incompatibility of requirements for optimizing short channel behavior and long term stability in MOSFETs", Solid-State Electronics, Vol. 31, p. 27 (1988).
-
(1988)
Solid-State Electronics
, vol.31
, pp. 27
-
-
Bauer, F.1
Jain, S.C.2
Korec, J.3
Lauer, V.4
Offenberg, M.5
Balk, P.6
-
97
-
-
0022290066
-
Halo doping effects in submicron DI-LDD device design
-
C.F. Codella, S. Ogura, "Halo doping effects in submicron DI-LDD device design", Proc. IEDM'85, p. 230 (1985).
-
(1985)
Proc. IEDM'85
, pp. 230
-
-
Codella, C.F.1
Ogura, S.2
-
98
-
-
84954106097
-
The impact of scaling on hot-carrier degradation and supply voltage of deep-submicron NMOS transistors
-
P. Woerlee, P. Damink, M. van Dort, C. Juffermans, C. de Kort, H. Lifka, W. Manders, G. Paulzen, H. Pomp, J. Slootboom, G. Streuker, R. Woltjer, "The impact of scaling on hot-carrier degradation and supply voltage of deep-submicron NMOS transistors", Proc. IEDM'91, p. 537 (1991).
-
(1991)
Proc. IEDM'91
, pp. 537
-
-
Woerlee, P.1
Damink, P.2
Van Dort, M.3
Juffermans, C.4
De Kort, C.5
Lifka, H.6
Manders, W.7
Paulzen, G.8
Pomp, H.9
Slootboom, J.10
Streuker, G.11
Woltjer, R.12
-
99
-
-
0024918845
-
Performance and hot-carrier reliability of deep-submicrometer CMOS
-
T.Y. Chan, H. Gaw, "Performance and hot-carrier reliability of deep-submicrometer CMOS", in IEDM'89 Tech. Dig., p. 71 (1989).
-
(1989)
IEDM'89 Tech. Dig.
, pp. 71
-
-
Chan, T.Y.1
Gaw, H.2
-
100
-
-
0022307940
-
Increase of resistance to hot-carriers in thin oxide MOSFETs
-
M. Yoshida, D. Tohyama, K. Maeguchi, K. Kanazaki, "Increase of resistance to hot-carriers in thin oxide MOSFETs", Proc. IEDM'85, p. 254 (1985).
-
(1985)
Proc. IEDM'85
, pp. 254
-
-
Yoshida, M.1
Tohyama, D.2
Maeguchi, K.3
Kanazaki, K.4
-
101
-
-
0025445360
-
Analysis of gate-oxide thickness dependence of hot-carrier induced degradation in thin gate oxide nMOSFETs
-
Y. Toyoshima, H. Iwai, F. Matsuoka, H. Hayashida, K. Maeguchi, K. Kanzaki, "Analysis of gate-oxide thickness dependence of hot-carrier induced degradation in thin gate oxide nMOSFETs", IEEE Trans. Electron Devices, Vol. ED-37, p.1496 (1990).
-
(1990)
IEEE Trans. Electron Devices
, vol.ED-37
, pp. 1496
-
-
Toyoshima, Y.1
Iwai, H.2
Matsuoka, F.3
Hayashida, H.4
Maeguchi, K.5
Kanzaki, K.6
-
102
-
-
0020783304
-
Hot-electron currents in very short channel MOSFET's
-
S. Tam, F.-C. Hsu, C. Hu, R.S. Muller, P.-K. Ko, "Hot-electron currents in very short channel MOSFET's", IEEE Electron Devices Lett., Vol. EDL-4, p. 249 (1983).
-
(1983)
IEEE Electron Devices Lett.
, vol.EDL-4
, pp. 249
-
-
Tam, S.1
Hsu, F.-C.2
Hu, C.3
Muller, R.S.4
Ko, P.-K.5
-
103
-
-
0020091438
-
Impact lonization at very low voltages in silicon
-
B. Eitan, D. Frohman-Bentchowsky, J. Shappir, "Impact lonization at very low voltages in silicon", J. Appl. Phys., Vol.53, p.1244 (1982).
-
(1982)
J. Appl. Phys.
, vol.53
, pp. 1244
-
-
Eitan, B.1
Frohman-Bentchowsky, D.2
Shappir, J.3
-
104
-
-
0028737243
-
Bias and temperature dependence of gate and substrate currents in n-MOSFETs at low drain voltage
-
D. Esseni, L. Selmi, R. Bez, E. Sangiotgi, B. Ricco, "Bias and temperature dependence of gate and substrate currents in n-MOSFETs at low drain voltage", Proc. IEDM'94, p. 307 (1994).
-
(1994)
Proc. IEDM'94
, pp. 307
-
-
Esseni, D.1
Selmi, L.2
Bez, R.3
Sangiotgi, E.4
Ricco, B.5
-
105
-
-
0024092336
-
Reduction of channel hot-electron generated substrate current in sub-150 nm channel length Si MOSFET's
-
G.G. Shadidi, D.A. Antoniadis, H.I. Smith, "Reduction of channel hot-electron generated substrate current in sub-150 nm channel length Si MOSFET's", IEEE Electron Devices Lett., Vol. EDL-9, p. 497 (1988).
-
(1988)
IEEE Electron Devices Lett.
, vol.EDL-9
, pp. 497
-
-
Shadidi, G.G.1
Antoniadis, D.A.2
Smith, H.I.3
-
106
-
-
0024860579
-
Low-voltage hot-electron currents and degradation in deep submicrometer MOSFETS
-
J. Chung, M.-C. Jeng, J.E. Moon, P.K. Ko, C. Hu, "Low-voltage hot-electron currents and degradation in deep submicrometer MOSFETS", Proc. IEDM'89, p. 92 (1989).
-
(1989)
Proc. IEDM'89
, pp. 92
-
-
Chung, J.1
Jeng, M.-C.2
Moon, J.E.3
Ko, P.K.4
Hu, C.5
-
108
-
-
0026383215
-
Comparison of shallow trench and LOCOS isolation for hot-carrier resistance
-
B. Doyle, R.S. O'Connor, K.R. Mistry, G.J. Grula, "Comparison of shallow trench and LOCOS isolation for hot-carrier resistance", IEEE Electron Devices Lett., Vol. EDL-12, p.673 (1991).
-
(1991)
IEEE Electron Devices Lett.
, vol.EDL-12
, pp. 673
-
-
Doyle, B.1
O'Connor, R.S.2
Mistry, K.R.3
Grula, G.J.4
-
109
-
-
0027589846
-
Temperature dependence of MOSFET substrate current
-
J.H. Huang, G.B. Zhang, Z.H. Liu, J. Duster, S.J. Wann, P. Ko, C. Hu, "Temperature dependence of MOSFET substrate current", IEEE Electron Devices Lett., Vol. EDL-14, p. 268 (1993).
-
(1993)
IEEE Electron Devices Lett.
, vol.EDL-14
, pp. 268
-
-
Huang, J.H.1
Zhang, G.B.2
Liu, Z.H.3
Duster, J.4
Wann, S.J.5
Ko, P.6
Hu, C.7
-
110
-
-
0023438796
-
Evaluation of channel hot carrier effects in n-MOS transistors at 77K with the charge pumping technique
-
P. Heremans, Y.-C. Sun, G. Groeseneken, H.E. Maes, "Evaluation of channel hot carrier effects in n-MOS transistors at 77K with the charge pumping technique", Appl. Surface Science, Vol. 30, p.313 (1987).
-
(1987)
Appl. Surface Science
, vol.30
, pp. 313
-
-
Heremans, P.1
Sun, Y.-C.2
Groeseneken, G.3
Maes, H.E.4
-
111
-
-
0024926690
-
Understanding of the temperature dependence of channel hot-carrier degradation in the range 77 to 300K
-
P. Heremans, G. van den Bosch, R. Bellens, G. Groeseneken, H. E. Maes, "Understanding of the temperature dependence of channel hot-carrier degradation in the range 77 to 300K", Proc. IEDM'89, p. 67 (1989).
-
(1989)
Proc. IEDM'89
, pp. 67
-
-
Heremans, P.1
Van Den Bosch, G.2
Bellens, R.3
Groeseneken, G.4
Maes, H.E.5
-
112
-
-
0024766815
-
A study of the increase of the effects of hot-carrier stress on NMOSFETs at low temperature
-
A. Acovic, M. Dutoit, M. Ilegems, "A study of the increase of the effects of hot-carrier stress on NMOSFETs at low temperature", IEEE Trans. Electron Dev., Vol. 36, p. 2603 (1989).
-
(1989)
IEEE Trans. Electron Dev.
, vol.36
, pp. 2603
-
-
Acovic, A.1
Dutoit, M.2
Ilegems, M.3
-
113
-
-
0021427595
-
Temperature dependence of hot-electron induced degradation in MOSFET's
-
F.-C. Hsu, K.Y. Chiu, "Temperature dependence of hot-electron induced degradation in MOSFET's", IEEE Electron Devices Lett., Vol. EDL-5, p. 148 (1984).
-
(1984)
IEEE Electron Devices Lett.
, vol.EDL-5
, pp. 148
-
-
Hsu, F.-C.1
Chiu, K.Y.2
-
114
-
-
34250841280
-
Gate current in OFF-state MOSFET
-
J. Chen, T.Y. Chan, P.K. Ko, C. Hu, "Gate current in OFF-state MOSFET", IEEE Electron Devices Lett., Vol. EDL-10, p. 203 (1989).
-
(1989)
IEEE Electron Devices Lett.
, vol.EDL-10
, pp. 203
-
-
Chen, J.1
Chan, T.Y.2
Ko, P.K.3
Hu, C.4
-
115
-
-
0026899077
-
Hot-carrier stress damage in the gate "off"-state in n-channel transistors
-
B.S. Doyle, K.R. Mistry, "Hot-carrier stress damage in the gate "off"-state in n-channel transistors", IEEE Trans. Electron Devices, Vol. ED-39, p. 1774 (1992).
-
(1992)
IEEE Trans. Electron Devices
, vol.ED-39
, pp. 1774
-
-
Doyle, B.S.1
Mistry, K.R.2
-
116
-
-
84954184783
-
NBTI-enhanced hot-carrier damage in p-channel MOSFET's
-
B.S. Doyle, B.J. Fishbein, K.R. Mistry, "NBTI-enhanced hot-carrier damage in p-channel MOSFET's", Proc. IEDM'91, p. 529 (1991).
-
(1991)
Proc. IEDM'91
, pp. 529
-
-
Doyle, B.S.1
Fishbein, B.J.2
Mistry, K.R.3
-
117
-
-
0002070177
-
How plasma etching damages thin gate oxides
-
C.T. Gabriel, J.P. McVittie, "How plasma etching damages thin gate oxides", Sol. State Tech., Vol. 35, p. 81 (1992).
-
(1992)
Sol. State Tech.
, vol.35
, pp. 81
-
-
Gabriel, C.T.1
McVittie, J.P.2
-
118
-
-
0043255687
-
Plasma etching charge-up damage to thin oxides
-
H. Shin, N. Jha, X-Y. Qian, G. W. Hills, C. Hu, "plasma etching charge-up damage to thin oxides", Solid State Tech., Vol 35, p. 29 (1993).
-
(1993)
Solid State Tech.
, vol.35
, pp. 29
-
-
Shin, H.1
Jha, N.2
Qian, X.-Y.3
Hills, G.W.4
Hu, C.5
-
119
-
-
0024907452
-
Gate oxide charging and its elimination for metal antenna capacitor and transistor in VLSI CMOS double layer metal technology
-
F. Shone, K. Wu, J. Shaw, E. Hokelek, S. Mittal, A. Haranahalli, "Gate oxide charging and its elimination for metal antenna capacitor and transistor in VLSI CMOS double layer metal technology", Tech. Dig. Symp. VLSI Tec. 1989, p. 73 (1989).
-
(1989)
Tech. Dig. Symp. VLSI Tec. 1989
, pp. 73
-
-
Shone, F.1
Wu, K.2
Shaw, J.3
Hokelek, E.4
Mittal, S.5
Haranahalli, A.6
-
120
-
-
0028272857
-
Effect of plasma-induced charging damage on n-channel and p-channel MOSFET hot-carrier reliability
-
K.R. Mistry, B.J. Fishbein, B.S. Doyle, "Effect of plasma-induced charging damage on n-channel and p-channel MOSFET hot-carrier reliability", Proc. IEEE IRPS'94, p.42 (1994).
-
(1994)
Proc. IEEE IRPS'94
, pp. 42
-
-
Mistry, K.R.1
Fishbein, B.J.2
Doyle, B.S.3
-
121
-
-
0028544536
-
Effects of low and high temperature anneal on process-induced damage of gate oxide
-
J.C. King, C. Hu, "Effects of low and high temperature anneal on process-induced damage of gate oxide", IEEE Electron Devices Lett., Vol. EDL-15, p. 475 (1994).
-
(1994)
IEEE Electron Devices Lett.
, vol.EDL-15
, pp. 475
-
-
King, J.C.1
Hu, C.2
-
122
-
-
0028253072
-
Characterization and optimization of metal etch processes to minimize charging damage to submicron transistor gate oxide
-
M.R. Lin, P. Fang, F. Heiler, R. Lee, R. Rakkhit, L. Shen, "Characterization and optimization of metal etch processes to minimize charging damage to submicron transistor gate oxide", IEEE Electron Devices Lett., Vol. EDL-15, p. 25 (1994).
-
(1994)
IEEE Electron Devices Lett.
, vol.EDL-15
, pp. 25
-
-
Lin, M.R.1
Fang, P.2
Heiler, F.3
Lee, R.4
Rakkhit, R.5
Shen, L.6
-
123
-
-
0028485883
-
Gate oxide damage reduction using a protective dielectric layer
-
C.T. Gabriel, M.G. Weling, "Gate oxide damage reduction using a protective dielectric layer", IEEE Electron Devices Lett., Vol. EDL-15, p. 269 (1994).
-
(1994)
IEEE Electron Devices Lett.
, vol.EDL-15
, pp. 269
-
-
Gabriel, C.T.1
Weling, M.G.2
-
124
-
-
0024700977
-
Hot-electron induced instability in 0.5μm p-channel MOSFET's patterned using synchrotron lithography
-
C.C.-H. Hsu, L.K. Wang, M.R. Wordeman, T.H. Ning, "Hot-electron induced instability in 0.5μm p-channel MOSFET's patterned using synchrotron lithography", IEEE Electron Devices Lett., Vol. EDL-10, p. 327 (1989).
-
(1989)
IEEE Electron Devices Lett.
, vol.EDL-10
, pp. 327
-
-
Hsu, C.C.-H.1
Wang, L.K.2
Wordeman, M.R.3
Ning, T.H.4
-
125
-
-
0022899925
-
Effects of X-ray irradiation on the channel hot-carrier reliability of thin oxide n-channel MOSFETs
-
J.Y.-C. Sun, J.R, Maldonado, M.D. Rodriguez, J. Laskar, D.S. Zicherman, "Effects of X-ray irradiation on the channel hot-carrier reliability of thin oxide n-channel MOSFETs", Proc. SSDM'1986, p. 479 (1986).
-
(1986)
Proc. SSDM'1986
, pp. 479
-
-
Sun, J.Y.-C.1
Maldonado, J.R.2
Rodriguez, M.D.3
Laskar, J.4
Zicherman, D.S.5
-
126
-
-
0010978966
-
2, and the threshold voltage shift dependence on oxide thickness
-
2, and the threshold voltage shift dependence on oxide thickness", J. Appl. Phys., Vol. 67, p.2992 (1990).
-
(1990)
J. Appl. Phys.
, vol.67
, pp. 2992
-
-
Walters, M.1
Reisman, A.2
-
127
-
-
0027656456
-
Reduced hot carrier reliability degradation of X ray irradiated MOSFETs in a 0.25μm CMOS technology with ultra thin gate oxide
-
A. Acovic, C.C.H. Hsu, L.C. Hsia, J.M. Aitken, "Reduced hot carrier reliability degradation of X ray irradiated MOSFETs in a 0.25μm CMOS technology with ultra thin gate oxide", Solid State Electr., Vol.36, p.1353 (1993)
-
(1993)
Solid State Electr.
, vol.36
, pp. 1353
-
-
Acovic, A.1
Hsu, C.C.H.2
Hsia, L.C.3
Aitken, J.M.4
-
128
-
-
0019476903
-
Threshold voltage instability in MOSFET's due to channel hot-hole emission
-
R.B. Fair, R.C. Sun, "Threshold voltage instability in MOSFET's due to channel hot-hole emission", IEEE Trans. Electron Devices, Vol. ED-28, p. 83 (1981).
-
(1981)
IEEE Trans. Electron Devices
, vol.ED-28
, pp. 83
-
-
Fair, R.B.1
Sun, R.C.2
-
129
-
-
0027816866
-
Evaluation of moisture induced hot-carrier degradation of n- and p-MOSFETs using steam stress
-
Y.H. Lee, S. Hui, B. Sabi, "Evaluation of moisture induced hot-carrier degradation of n-and p-MOSFETs using steam stress", IEDM'93 Techical Digest, p. 523 (1993).
-
(1993)
IEDM'93 Techical Digest
, pp. 523
-
-
Lee, Y.H.1
Hui, S.2
Sabi, B.3
-
130
-
-
0027657052
-
2 film
-
2 film", IEEE Trans. Electron Devices, Vol. ED-40, p. 1682 (1993).
-
(1993)
IEEE Trans. Electron Devices
, vol.ED-40
, pp. 1682
-
-
Shimoyama, N.1
Machide, K.2
Takahashi, J.-I.3
Murase, K.4
Minegishi, K.5
Tsuchiya, T.6
-
132
-
-
0028294836
-
Analysis of externally imposed mechanical stress effects on the hot-carrier induced degradation of MOSFETs
-
R. Degraeve, I. de Wolf, G. Groseneken, H.E. Maes, "Analysis of externally imposed mechanical stress effects on the hot-carrier induced degradation of MOSFETs", Proc. IRPS'94, p. 29 (1994).
-
(1994)
Proc. IRPS'94
, pp. 29
-
-
Degraeve, R.1
De Wolf, I.2
Groseneken, G.3
Maes, H.E.4
-
133
-
-
0021401123
-
Structure-enhanced MOSFET degradation due to hot-electron injection
-
F.-C. Hsu, H.R. Grinolds, "Structure-enhanced MOSFET degradation due to hot-electron injection", IEEE Electron Devices Lett., Vol. EDL-5, p. 71 (1984).
-
(1984)
IEEE Electron Devices Lett.
, vol.EDL-5
, pp. 71
-
-
Hsu, F.-C.1
Grinolds, H.R.2
-
134
-
-
0022307929
-
Hot electron degradation in submicron VLSI
-
F.-C. Hsu, J. Hui, K.Y. Chiu, "Hot electron degradation in submicron VLSI"", Proc. IEDM'85, p. 48 (1985).
-
(1985)
Proc. IEDM'85
, pp. 48
-
-
Hsu, F.-C.1
Hui, J.2
Chiu, K.Y.3
-
135
-
-
0022955270
-
The effects of weak gate-to-drain (source) overlap on MOSFET characteristics
-
P.K. Ko, T.Y. Chan, A.T. Wu, C. Hu, "The effects of weak gate-to-drain (source) overlap on MOSFET characteristics", in IEDM Tech. Dig., p. 292 (1986).
-
(1986)
IEDM Tech. Dig.
, pp. 292
-
-
Ko, P.K.1
Chan, T.Y.2
Wu, A.T.3
Hu, C.4
-
136
-
-
0022288595
-
Modified LDD device structures for VLSI
-
S. Bampi, J.D. Plummer, "Modified LDD device structures for VLSI", in IEDM Tech. Dig., p.234 (1985).
-
(1985)
IEDM Tech. Dig.
, pp. 234
-
-
Bampi, S.1
Plummer, J.D.2
-
137
-
-
0019049847
-
Design and characteristics of the lightly doped drain-source (LDD) insulated gate field-effect transistor
-
S. Ogura, P.J. Tsang, W.W. Walker, D. Critchlow, J.F. Shepard, "Design and characteristics of the lightly doped drain-source (LDD) insulated gate field-effect transistor", IEEE Trans. Electron Devices, Vol. ED-27, p. 1359 (1980).
-
(1980)
IEEE Trans. Electron Devices
, vol.ED-27
, pp. 1359
-
-
Ogura, S.1
Tsang, P.J.2
Walker, W.W.3
Critchlow, D.4
Shepard, J.F.5
-
138
-
-
0023548487
-
The impact of gate-drain overlapped LDD (GOLD) for deep submicron VLSI's
-
R. Izawa, T. Kure, S. Iijima, E. Takeda, "The impact of gate-drain overlapped LDD (GOLD) for deep submicron VLSI's", in IEDM Tech. Dig., p. 32 (1987).
-
(1987)
IEDM Tech. Dig.
, pp. 32
-
-
Izawa, R.1
Kure, T.2
Iijima, S.3
Takeda, E.4
-
139
-
-
0024684021
-
Drain-engineered hot-electron-resistant device structures: A review
-
J.J. Sanchez, K.K. Hsueh, T.A. DeMassa, "Drain-engineered hot-electron-resistant device structures: a review", IEEE Trans. Electron Devices, Vol. ED-36, p.1125 (1989).
-
(1989)
IEEE Trans. Electron Devices
, vol.ED-36
, pp. 1125
-
-
Sanchez, J.J.1
Hsueh, K.K.2
DeMassa, T.A.3
-
140
-
-
0026866797
-
A fundamental performance limit of optimized 3.3V sub-quarter-micrometer fully overlapped LDD MOSFET's
-
A. Bryant, B. El-Jareh, T. Furukawa, W.P. Noble, E.J. Nowak, W. Schwittek, W. Tonti, "A fundamental performance limit of optimized 3.3V sub-quarter-micrometer fully overlapped LDD MOSFET's", IEEE Trans. Electron Devices, Vol. ED-39, p. 1208 (1992).
-
(1992)
IEEE Trans. Electron Devices
, vol.ED-39
, pp. 1208
-
-
Bryant, A.1
El-Jareh, B.2
Furukawa, T.3
Noble, W.P.4
Nowak, E.J.5
Schwittek, W.6
Tonti, W.7
-
141
-
-
84954184836
-
Very lightly nitrided oxide gate MOSFETs for deep-sub-micron CMOS devices
-
H.S. Momose, T, Morimoto, Y. Ozawa, M. Tsuchiaki, M. Ono, K. Yamabe, H. Iwai, "Very lightly nitrided oxide gate MOSFETs for deep-sub-micron CMOS devices", IEDM'91 Techical Digest, p. 359 (1991).
-
(1991)
IEDM'91 Techical Digest
, pp. 359
-
-
Momose, H.S.1
Morimoto, T.2
Ozawa, Y.3
Tsuchiaki, M.4
Ono, M.5
Yamabe, K.6
Iwai, H.7
-
143
-
-
0027889411
-
SOI for a 1-volt CMOS technology and application to a 512 Kb SRAM with 3.5 ns access time
-
G.G. Shahidi, T.H. Ning, T.I. Chappell, J.H. Comfort, B.A. Chappell, R. Franch, C.J. Andersen, P.W. Cook, S.E. Schuster, M.G. Rosenfield, M.R. Polcari, R.H. Dennard, B. Davari, "SOI for a 1-volt CMOS technology and application to a 512 Kb SRAM with 3.5 ns access time", Proc. IEDU'93, p. 813 (1993).
-
(1993)
Proc. IEDU'93
, pp. 813
-
-
Shahidi, G.G.1
Ning, T.H.2
Chappell, T.I.3
Comfort, J.H.4
Chappell, B.A.5
Franch, R.6
Andersen, C.J.7
Cook, P.W.8
Schuster, S.E.9
Rosenfield, M.G.10
Polcari, M.R.11
Dennard, R.H.12
Davari, B.13
-
144
-
-
0028202415
-
Characterization of hot-carrier effects in thin-film fully depleted SOI MOSFETs
-
Z.J. Ma, H.J. Wann, M. Chan, J. King, Y.C. Cheng, P.K. Ko, C. Hu, "Characterization of hot-carrier effects in thin-film fully depleted SOI MOSFETs", Proc. IRPS'94, P-52 (1994).
-
(1994)
Proc. IRPS'94
, pp. 52
-
-
Ma, Z.J.1
Wann, H.J.2
Chan, M.3
King, J.4
Cheng, Y.C.5
Ko, P.K.6
Hu, C.7
-
146
-
-
0025494439
-
Degradation in thin-film SOI MOSFET's caused by single-transistor latch
-
R.J.T. Bunyan, M.J. Uren, N.J. Thomas, J.R. Davis, "Degradation in thin-film SOI MOSFET's caused by single-transistor latch", IEEE Electron Devices Lett., Vol. EDL-11, p.359 (1990).
-
(1990)
IEEE Electron Devices Lett.
, vol.EDL-11
, pp. 359
-
-
Bunyan, R.J.T.1
Uren, M.J.2
Thomas, N.J.3
Davis, J.R.4
-
147
-
-
0026168694
-
Hot-carrier-induced degradation of the back interface in short-channel silicon-on-insulator MOSFET's
-
T. Ouisse, S. Cristoloveanu, G. Borel, "Hot-carrier-induced degradation of the back interface in short-channel Silicon-on-Insulator MOSFET's", IEEE Electron Devices Lett., Vol. EDL-12, p. 290 (1991).
-
(1991)
IEEE Electron Devices Lett.
, vol.EDL-12
, pp. 290
-
-
Ouisse, T.1
Cristoloveanu, S.2
Borel, G.3
-
148
-
-
0026927932
-
Hot-carrier-induced degradation mechanisms in short-channel SIMOX p-MOSFET's
-
T. Ouisse, A.J. Auberton Hervé, B. Giffard, G. Reimbold, "Hot-carrier-induced degradation mechanisms in short-channel SIMOX p-MOSFET's", Microelectronics Eng. (Proc. ESSDERC'92), Vol. 19, p. 473 (1992).
-
(1992)
Microelectronics Eng. (Proc. ESSDERC'92)
, vol.19
, pp. 473
-
-
Ouisse, T.1
Auberton Hervé, A.J.2
Giffard, B.3
Reimbold, G.4
-
149
-
-
0028255853
-
Hot-carrier induced degradation in ultra-thin, fully-depleted, deep submicron NMOS and PMOS SOI transistors
-
T. Tsuchiya, T. Ohno, Y. Kado, J. Kai, "Hot-carrier induced degradation in ultra-thin, fully-depleted, deep submicron NMOS and PMOS SOI transistors", Proc. IRPS'94, p.57 (1994).
-
(1994)
Proc. IRPS'94
, pp. 57
-
-
Tsuchiya, T.1
Ohno, T.2
Kado, Y.3
Kai, J.4
-
150
-
-
0026381229
-
Back-cahhenl hot-electron effects on the front channel characteristics in thin-film SOI MOSFET's
-
B. Zhang, T.P. Ma, "Back-cahhenl hot-electron effects on the front channel characteristics in thin-film SOI MOSFET's", IEEE Electr. Dev. Let., Vol. EDL-12, p. 699 (1991).
-
(1991)
IEEE Electr. Dev. Let.
, vol.EDL-12
, pp. 699
-
-
Zhang, B.1
Ma, T.P.2
-
151
-
-
84941865239
-
A new instability in MOS transitor caused bu hot electron and hot hole injection from drain avalanche plasma into gate oxide
-
H. Hara, Y. Okamoto, H. Ohnuma, "A new instability in MOS transitor caused bu hot electron and hot hole injection from drain avalanche plasma into gate oxide", Jap. J. of Appl. Phys., Vol. 9, p. 1103, (1970).
-
(1970)
Jap. J. of Appl. Phys.
, vol.9
, pp. 1103
-
-
Hara, H.1
Okamoto, Y.2
Ohnuma, H.3
-
152
-
-
0023542548
-
The impact of gate-induced drain leakage current on MOSFET scaling
-
T.Y. Chan, J. Chen, P.K. Ko, C. Hu, "The impact of gate-induced drain leakage current on MOSFET scaling", Proc. IEDM'87, p. 718 (1987).
-
(1987)
Proc. IEDM'87
, pp. 718
-
-
Chan, T.Y.1
Chen, J.2
Ko, P.K.3
Hu, C.4
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