Contamination control for processing DUV chemically amplified photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2438, Issue , 1995, Pages 626-643

  Vigil, Joseph C ^a   Barrick, Mark W ^a   Grafe, Tim H ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL VARIABLES CONTROL; CONTAMINANTS; DESIGN; FILTERS (FOR FLUIDS); INDUSTRIAL ECONOMICS; PHOTOLITHOGRAPHY; PROCESSING;

AIRBORNE CONTAMINANTS; CARBON FILTERS; CHEMICALLY AMPLIFIED RESISTS; CLEAN ENVIRONMENT; COST ANALYSIS; CRITICAL DIMENSIONS; DEEP ULTRAVIOLET RESISTS; METHYLPYROLIDONE; POST EXPOSURE DELAY; RESIST PROFILES;

PHOTORESISTS;

EID: 0029224104     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)