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Volumn 22, Issue 1, 1994, Pages 31-42

Plasma Processing

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC DISCHARGES; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; INTEGRATED CIRCUITS; MATERIALS SCIENCE; MICROELECTRONICS; PLASMA APPLICATIONS; PROCESSING; THIN FILMS;

EID: 0028378253     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.281547     Document Type: Article
Times cited : (168)

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