Improved dose metrology in optical lithography

Solid State Technology

Volumn 39, Issue 4, 1996, Pages 75-80

  Cromer, Christopher L ^a,b,c,d   Lucatorto, Thomas B ^a,e,f   O'Brian, Thomas R ^a,g,h   Walhout, Matthew ^a,f,i  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^c UNIVERSITY OF SOUTHERN CALIFORNIA   (United States)

^d NIST Radiometric Physics Division

^e Och Spine at New York Presbyterian Hospitals

^f NIST

^g UNIVERSITY OF WISCONSIN MADISON   (United States)

^h Electron Optical Physics Division

ⁱ UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTRONICS; PERFORMANCE; PROCESS CONTROL; QUALITY CONTROL; RADIOMETERS; RADIOMETRY; STANDARDS; SYNCHROTRON RADIATION; ULTRAVIOLET DETECTORS;

BLACK BODY THERMAL SOURCES; CRITICAL DIMENSIONS; ELECTRICAL SUBSTITUTION RADIOMETERS; IRRADIANCE MEASUREMENT; OPTICAL LITHOGRAPHY; RADIOMETRIC STANDARDS; SYNCHROTRON RADIATION SOURCES; UNCERTAINTY;

PHOTOLITHOGRAPHY;

EID: 0030125772     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (13)

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