Picosecond optoelectronic on-wafer characterization of coplanar waveguides on high-resistivity Si and Si/SiO2 substrates

Microelectronic Engineering

Volumn 31, Issue 1-4, 1996, Pages 385-395

  Pfeifer, T ^a   Heiliger, H M ^a   Loffler T ^a   Roskos, H G ^a   Kurz, H ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; ELECTROMAGNETIC DISPERSION; ELECTROMAGNETIC WAVE ABSORPTION; ELECTROMAGNETIC WAVE ATTENUATION; OPTICAL SWITCHES; OPTICAL VARIABLES MEASUREMENT; SILICA; SILICON WAFERS; TIME DOMAIN ANALYSIS;

INSULATION LAYER; MICROWAVE ABSORPTION; MICROWAVE ATTENUATION; MICROWAVE DISPERSION; OPTOELECTRONIC MEASUREMENTS; PHOTOCONDUCTIVE SWITCHES; ULTRASHORT ELECTRIC PULSE INJECTION;

WAVEGUIDES;

EID: 0030082758     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00361-4     Document Type: Article

References (12)

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