Characterization of the induction effect at mid-ultraviolet exposure: Application to AZ2400 at 313 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 334, Issue , 1982, Pages 196-205

  Hofer, Donald C ^a   Grant Willson, C ^a   Neureuther, Andrew R ^b   Hakey, Mark ^c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; EXPOSURE TOOLS; LITHOGRAPHY; RESIST PROFILES; UV;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0020242348     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.933577     Document Type: Conference Paper

References (16)

1. B. J. Lin, E. Bassous, V. W. Chao and K. E. Petrillo, J. Vac. Sci. Technol. 19, 1343 (1981).
2. E. Reichmanis, C. W. Wilkins and E. A. Chandross, J. Vac. Sci. Technol. 19, 1338 (1981).
3. B. D. Grant, N. J. Clecak, R. J. Twieg and C. G. Willson, IEEE Trans. Electron Devices, ED-28, 1300 (1981).
4. K. L. Tai, R. G. Vadinsky and E. Ong, SPIE Proceedings 333, 333-06 (1982).
5. J. H. Bruning, J. Vac. Sci. Technol. 16, 1925 (1979).
6. M. Hakey and D. A. Badami, “VLSI Lithographic Processing with a 1:1 Projection Printer,” Semicon West Technical Presentation, Menlo Park, California (1982).
7. F. H. Dill, A. R. Neureuther, J. A. Tuttle and E. J. Walker, IEEE Trans. Electron Devices ED-22, 456 (1975).
8. W. G. Oldham, S. N. Nandgashkar, A. R. Neutreuther and M. O'Toole, IEEE Trans. Electron Devices, ED-26, 717 (1979).
9. Our data was recorded on an instrument similar in design to that described in references a and b below. The detailed description of the instrument will be published by D. Raimondi, P. Ruscitto and R. Martin, IBM Research, San Jose, California.
10. K. L. Konnerth and F. H. Dill, Solid State Electron. 15, 371 (1972).
11. K. L. Konneth and F. H. Dill, IEEE Trans. Electron Devices ED-22, 452 (1975).
12. D. F. Kyser and R. Pyle, IBM J. Res. and Dev. 24, 426 (1980).
13. W. A. Pliskin, ELectrochemical Society Presentation, Montreal, Canada (1982).
14. J. M. Shaw and M. Hatzakis, J. Vac. Sci. Technol. 19, 1343 (1981).
15. Dose correlation by J. M. Shaw is gratefully acknowledged.
16. M. Hakey and W. Strauls, J. Electronic Materials, in press (1982).