Sequential screening in semiconductor manufacturing, II: Exploiting lot-to-lot variability

Operations Research

Volumn 44, Issue 1, 1996, Pages 196-205

  Ou, Jihong ^a   Wein, Lawrence M ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GAMMA DISTRIBUTION; GAMMA RANDOM VARIABLE; LOT TO LOT VARIABILITY; MARKOV RANDOM FIELDS; MAXIMUM LIVELIHOOD ESTIMATION; OPTIMAL POLICY; SEQUENTIAL SCREENING; WAFER LEVEL;

MARKOV PROCESSES; MATHEMATICAL MODELS; OPTIMIZATION; PARAMETER ESTIMATION; PROBABILITY; QUALITY CONTROL; RANDOM PROCESSES; SEMICONDUCTOR DEVICE MANUFACTURE;

OPERATIONS RESEARCH;

EID: 0029733604     PISSN: 0030364X     EISSN: None     Source Type: Journal    
DOI: 10.1287/opre.44.1.196     Document Type: Article

References (3)

1. BOHN, R. E. 1995. Noise and Learning in Semiconductor Manufacturing. Mgmt. Sci. 41, 31-42.
2. LONGTIN, M., L. M. WEIN, AND R. E. WELSCH. 1996. Sequential Screening in Semiconductor Manufacturing, I: Exploiting Spatial Dependence. Opns. Res. 44, 173-195.
3. OU, J., AND L. M. WEIN. 1992. Sequential Screening in Semiconductor Manufacturing, I: Exploiting Lot-to-Lot Variability. Sloan School of Management, MIT, Cambridge, Mass.