SCOPUS 정보 검색 플랫폼

Solid-State Electronics

Volumn 40, Issue 1-8, 1996, Pages 25-28

Magneto transport on antidot arrays, fabricated by an atomic force microscope

(4) Wendel, M a Lorenz, H a Kotthaus, J P a Holland, M b

a UNIVERSITY OF MUNICH (Germany)

b UNIVERSITY OF GLASGOW (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; ETCHING; HETEROJUNCTIONS; ION BEAMS; IRRADIATION; MAGNETORESISTANCE; MASKS; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; TRANSPORT PROPERTIES;

ANTIDOT ARRAYS; ION BEAM IRRADIATION; MAGNETO TRANSPORT; RESIST MASK; RESISTANCE FLUCTUATIONS;

ELECTRON DEVICE MANUFACTURE;

EID: 0029703574 PISSN: 00381101 EISSN: None Source Type: Journal
DOI: 10.1016/0038-1101(95)00207-3 Document Type: Article

Times cited : (3)

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