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Volumn 20, Issue 11, 1995, Pages 65-69

Simulation of Microstructure and Surface Profiles of Thin Films for VLSI Metallization

(3)  Smy, T a   Dew, S K a   Brett, M J a  

a NONE

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COMPUTER SIMULATION LANGUAGES; ETCHING; FILM GROWTH; METALLIZING; MICROSTRUCTURE; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; VLSI CIRCUITS;

EID: 0029406366     PISSN: 08837694     EISSN: 19381425     Source Type: Journal    
DOI: 10.1557/S0883769400045619     Document Type: Article
Times cited : (14)

References (16)
  • 3
    • 5244285570 scopus 로고
    • TECHCON '90, extended abstract volume
    • Semiconductor Research Corporation, San Jose
    • J. McVittie, J. Rey, L.-Y. Cheng, A. Bariya, S. Ravi, and K. Saraswat, TECHCON '90, extended abstract volume (Semiconductor Research Corporation, San Jose, 1990) p. 16.
    • (1990) , pp. 16
    • McVittie, J.1    Rey, J.2    Cheng, L.-Y.3    Bariya, A.4    Ravi, S.5    Saraswat, K.6
  • 14
    • 84953682805 scopus 로고
    • J.A. Thornton, JVST A 4 (6) (1986) p. 3059.
    • (1986) JVST , vol.A 4 , Issue.6 , pp. 3059
    • Thornton, J.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.