|
Volumn 20, Issue 11, 1995, Pages 65-69
|
Simulation of Microstructure and Surface Profiles of Thin Films for VLSI Metallization
a a a
a
NONE
|
Author keywords
[No Author keywords available]
|
Indexed keywords
COMPUTER SIMULATION;
COMPUTER SIMULATION LANGUAGES;
ETCHING;
FILM GROWTH;
METALLIZING;
MICROSTRUCTURE;
NUCLEATION;
SCANNING ELECTRON MICROSCOPY;
SURFACE STRUCTURE;
VLSI CIRCUITS;
FLUX SHADOWING;
INTERCONNECTION;
INTERFACIAL PHENOMENA;
SURFACE DIFFUSION;
SURFACE PROFILES;
THIN FILMS;
|
EID: 0029406366
PISSN: 08837694
EISSN: 19381425
Source Type: Journal
DOI: 10.1557/S0883769400045619 Document Type: Article |
Times cited : (14)
|
References (16)
|