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Volumn 44, Issue 1, 1994, Pages 83-89
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Electrostatically deflectable polysilicon torsional mirrors
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
COMPUTER SIMULATION;
ELECTROSTATICS;
ETCHING;
FINITE ELEMENT METHOD;
MECHANICAL PROPERTIES;
MICROMACHINING;
MICROSTRUCTURE;
MIRRORS;
SOLVENTS;
ELECTROSTATICALLY DEFLECTABLE POLYSILICON TORSIONAL MIRRORS;
SOFTWARE PACKAGE ANSYS;
SILICON SENSORS;
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EID: 0028467254
PISSN: 09244247
EISSN: None
Source Type: Journal
DOI: 10.1016/0924-4247(94)00785-3 Document Type: Article |
Times cited : (21)
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References (18)
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